Phase change memory and manufacturing method thereof
A phase change memory and phase change storage technology, applied in the field of semiconductors, can solve the problems of long duration of phase transition of the phase change memory layer, limiting the writing speed of phase change memory, etc., to reduce power consumption and duration , Improve the effect of writing speed
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[0125] Figure 5a to Figure 5j It is a manufacturing method of a phase change memory shown according to an exemplary embodiment. refer to Figure 5a to Figure 5j , the method includes the following steps:
[0126] Step 1: Refer to Figure 5a As shown, the first conductive material layer 1110 and the storage stack structure are formed on the surface of the substrate 1001, and the first mask layer 1261 covering the storage stack structure is formed; wherein, the storage stack structure includes: the first An electrode material layer 1211a, a gate material layer 1221, a first induction material layer 1231, a phase change storage material layer 1241 and a second electrode material layer 1211b; the first induction material layer 1231 is used to induce a phase change storage material layer 1241 Transition from amorphous to crystalline phase.
[0127] The constituent material of the first conductive material layer 1110 includes a conductive material. Conductive materials include...
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