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Semiconductor structure and method of forming integrated circuit structure

A semiconductor and power rail technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc.

Pending Publication Date: 2021-06-29
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, existing backside power rails still face challenges including routing resistance, alignment margins, layout flexibility, and packaging density

Method used

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  • Semiconductor structure and method of forming integrated circuit structure
  • Semiconductor structure and method of forming integrated circuit structure
  • Semiconductor structure and method of forming integrated circuit structure

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Embodiment Construction

[0013] It should be understood that the following disclosure provides many different embodiments or examples for implementing different features of the invention. Specific embodiments or examples of components and arrangements are described below to simplify the present disclosure. Of course these are examples only and are not intended to be limiting. Furthermore, the present invention may repeat reference numerals and / or letters in various examples. This repetition is for the sake of simplicity and clarity and does not in itself indicate a relationship between the various embodiments and / or configurations discussed. In addition, in the following description, forming a first component over or on a second component may include an embodiment in which the first component and the second component are formed in direct contact, and may also include an embodiment in which a first component may be formed between the first component and the second component. Additional components suc...

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Abstract

The present disclosure provides one embodiment of a semiconductor structure. The semiconductor structure includes a substrate having a front side and a back side; a gate stack formed on the front side of the substrate and disposed on an active region of the substrate; a first source / drain part formed on the active region and disposed at an edge of the gate stack; a backside power rail formed on the back side of the substrate; and a backside contact part interposed between a backside power rail and the first source / drain part, and electrically connecting the backside power rail to the first source / drain part. The backside contact part further includes a first silicide layer on the back side of the substrate. Embodiments of the invention also relate to a method of forming an integrated circuit structure.

Description

technical field [0001] Embodiments of the invention relate to semiconductor structures and methods of forming integrated circuit structures. Background technique [0002] Integrated circuits have been developed as advanced technologies with smaller feature sizes such as 7nm, 5nm, and 3nm. In these advanced technologies, the gate pitch (spacing) keeps shrinking, thus causing a link to gate bridge problems. Furthermore, three-dimensional transistors with fin-shaped active regions are generally required to enhance device performance. Those three-dimensional field effect transistors (FETs) formed on fin-type active regions are also called FinFETs. FinFETs require narrow fin widths for short channel control, which results in smaller source / drain regions compared to planar FETs. This will reduce the alignment margin and cause further shrinking device pitch and increasing packing density. As devices scale down, power lines are formed on the backside of the substrate. However, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/092H01L21/8238
CPCH01L27/0924H01L27/0928H01L21/823821H01L21/823871H01L21/823475H01L21/743H01L23/5286H01L21/76897H01L21/823431H01L29/0886H01L21/823418H01L27/0886H01L29/66795H01L29/785
Inventor 黄禹轩蔡庆威钟政庭庄正吉张尚文
Owner TAIWAN SEMICON MFG CO LTD
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