Levelness measuring device and levelness adjusting method

Abstract

The invention discloses a levelness measuring device and a levelness adjusting method. The levelness measuring device is used for measuring the levelness between a measured object and a reference object in semiconductor equipment. The measured object and the reference object are both arranged in a reaction chamber enclosed by a transparent cover and a reaction chamber. The levelness measuring device comprises a mounting piece, a connecting piece and a distance measuring sensor, the mounting piece can be arranged on the semiconductor equipment, and the distance measuring sensor is movably mounted on the mounting piece through the connecting piece. The distance measuring sensor can measure first distances between a plurality of preset positions on the measured object and corresponding positions on the reference object in the axial direction of the reference object through the transparent cover, and the first distances are used for measuring the levelness between the measured object and the reference object. According to the technical scheme, the problems that the measurement precision of the relative levelness between the measured object such as the base and the reference object such as the preheating ring is poor and the process continuity is influenced can be solved.

Description

technical field [0001] The invention relates to the technical field of semiconductor processing, in particular to a levelness measuring device and a levelness adjustment method. Background technique [0002] The epitaxy process is a common process in the semiconductor processing process. The process gas is passed into the reaction chamber through the gas inlet hole, and the process gas passes through the surface of the substrate, so that the growth atoms can be deposited on the substrate and a single crystal layer can be grown. . In the epitaxial process, the substrate is usually placed on the susceptor, and the preheating ring set outside the susceptor can heat the susceptor, and the relative level between the susceptor and the preheating ring will affect the temperature on the susceptor. The temperature distribution, in the case of poor levelness, will have an adverse effect on the thickness consistency of the epitaxial layer due to the different temperatures at different...

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Problems solved by technology

[0003] The invention discloses a levelness measuring device and a levelness adjustment method to solve the problem that the measurement accuracy of the relative levelness between the measured object such as the base and the reference object such as the preheating ring is poor and affects the continuity of the process

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