A stacked cavity device for position calibration

Abstract

The invention provides a stacked structure cavity device which is convenient for position calibration, and relates to the technical field of high-end semiconductor device manufacturing. Including upper and lower stacking structure cavity, interlayer table, table sealing block, bottom table, calibration fixture block and calibration rod pin, table sealing block is detachably installed in the table through hole, on the table sealing block A sealing block calibration hole is provided, and a table calibration hole is provided on the bottom table. The calibration fixture block can replace the table sealing block and is installed in the table through hole. The calibration fixture block is provided with a fixture block calibration hole. The rod pin is used to insert the first calibration hole and the sealing block calibration hole to calibrate the position of the first mechanical gripper, and is also used to insert the fixture block calibration hole, the second calibration hole and the table calibration hole to calibrate the second mechanical The position of the gripper. In this way, the calibration rod pin is used to penetrate the interlayer platform without affecting the performance of the chamber, and combined with the calibration jig block, the mechanical gripper in the non-top chamber can be directly calibrated, which is easy to operate and has high precision.

Description

technical field [0001] The invention relates to the technical field of semiconductor high-end equipment manufacturing, in particular to a stacked structure cavity equipment that is convenient for position calibration. Background technique [0002] Before the vapor deposition equipment performs the process, it is necessary to calibrate the position of the mechanical gripper for grabbing and transporting the wafer in the cavity to ensure the accuracy of the transfer position of the mechanical gripper and the uniformity of the coating. [0003] In the existing public technology, the arrangement positions of the high vacuum loading chamber (Load Lock Chamber, LLC for short) and the high vacuum cooling chamber (Cool Down Chamber, CDC for short) of vapor deposition equipment (including RiD, PVD, CVD) are generally mutually Independent or interconnected horizontal arrangement, that is, distributed in the front, rear or left and right positions on the same horizontal plane. This ki...

AI Technical Summary

Problems solved by technology

For the position calibration of the mechanical gripper of the upper and lower stacked structure cavities, the uppermost cavity can still use the existing public calibration method, but for the non-uppermost cavity, it cannot be directly calibrated due to vertical stacking, resulting in calibration The process is not direct and the results of the calibration are not reliable

Images