Unlock instant, AI-driven research and patent intelligence for your innovation.

Preparation method of array substrate, array substrate and display panel

An array substrate and display panel technology, which is applied in semiconductor/solid-state device manufacturing, instruments, semiconductor devices, etc., can solve the problems of display panel climbing and disconnection, and achieve the effect of avoiding disconnection

Active Publication Date: 2021-10-08
SUZHOU CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The embodiment of the present application provides a preparation method of an array substrate, an array substrate and a display panel, aiming to solve the problem that the display panel in the prior art is prone to climbing and disconnection

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of array substrate, array substrate and display panel
  • Preparation method of array substrate, array substrate and display panel
  • Preparation method of array substrate, array substrate and display panel

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application.

[0048]In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", " rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc., or The positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present application discloses a method for preparing an array substrate, an array substrate, and a display panel. By providing a first substrate, the first substrate includes a stacked first metal layer, a first insulating layer, a second metal layer, and a second insulating layer; The second metal layer and the second insulating layer are provided with openings at positions corresponding to the first metal layer, and part of the first insulating layer leaks out; at the same time, a third metal layer is prepared above the first substrate, and the third metal layer is at the opening. While disconnecting, the part of the third metal layer above the opening is also connected to the second metal layer. The disconnected second metal layer is connected through the third metal layer to realize the conduction of the second metal layer and avoid the problem of disconnection of the second metal layer at the opening.

Description

technical field [0001] The present application relates to the field of display technology, and in particular, to a preparation method of an array substrate, an array substrate and a display panel. Background technique [0002] Due to product design requirements in the traditional Thin Film Transistor Liquid Crystal Display (TFT LCD) process, when the metal traces of the source and drain metal layers pass through the position of the gate metal layer, a ramp needs to be performed. Affected by the topography of the climbing position, during the photoresist coating process, the photoresist leveling is not good, and the photoresist filling is incomplete at the climbing position, and pores are easily formed between the metal and the photoresist, so that the chemical liquid penetrates into the pores during the etching process. During the process, pore corrosion occurs, which leads to abnormal occurrence of climbing and disconnection, which greatly affects the yield of the display p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77H01L27/12G02F1/1362G02F1/1368
CPCG02F1/1362G02F1/1368H01L27/1244H01L27/1259
Inventor 谭芳
Owner SUZHOU CHINA STAR OPTOELECTRONICS TECH CO LTD