Equipment for detecting flow resistance of spraying plate and detection method

Abstract

The invention provides equipment for detecting flow resistance of a spraying plate and a flow resistance detection method based on the equipment. The equipment comprises an air inlet system, a detection chamber, an air exhaust system, a first vacuum gauge and a second vacuum gauge, the air inlet system at least comprises an air inlet pipeline, and the air inlet pipeline is communicated with the cavity; the chamber comprises an upper surface, a side surface and a bottom surface which are connected to form the chamber; communicating holes are formed in the upper surface and the bottom surface; the first vacuum gauge and the second vacuum gauge are correspondingly communicated with the communicating holes in the upper surface and the bottom surface through pipelines respectively; the spraying plate is arranged near the top in the vacuum chamber; and the air exhaust system comprises an air exhaust pipeline which is communicated with the interior of the vacuum chamber through the bottom surface. The equipment is simple in structure, can accurately detect the flow resistance of different spraying plates, is short in detection time, does not cause contact damage to the spraying plates, and solves the problem of process difference between different cavities through the spraying plates with simple structures.

Description

technical field [0001] The invention belongs to the technical field of spray plate testing, and specifically provides a device for detecting the flow resistance of a spray plate and a flow resistance detection method based on the device. Background technique [0002] In the deposition reaction of semiconductor equipment, the spray plate is an important structural part that affects the process effect. When the manufacturer conducts the factory inspection of the spray plate, there will be inspection deviations. The reaction gas reaches the chamber through the spray head. Different spray heads Aperture size and depth errors will affect the repeatability and stability of the cavity deposition process, thereby affecting the quality of the product. In actual production, in some semiconductor equipment, two chambers usually share a set of vacuum system, so the shower head is the decisive factor that affects the differences in the deposition process between chambers based on the sam...

AI Technical Summary

Problems solved by technology

[0002] In the deposition reaction of semiconductor equipment, the spray plate is an important structural part that affects the process effect. When the manufacturer conducts the factory inspection of the spray plate, there will be inspection deviations. The reaction gas reaches the chamber through the spray head. Different spray heads Aperture size and depth errors will affect the repeatability and stability of the cavity deposition process, thereby affecting the quality of the product

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