Elastic wave detection platform based on photoelastic effect

Abstract

The invention discloses an elastic wave detection platform based on a photoelastic effect, the platform comprises an elastic wave generation unit and an optical elliptical polarization measurement unit, the elastic wave generation unit is composed of an adjustable voltage stabilization source and a piezoelectric actuator; the optical elliptical polarization measurement unit is composed of a He-Ne laser light source, a spectroscope, a polarizer, a photoelastic sampling sensor, a quarter-wave plate, a Wollaston prism, a photoelectric balance detector, an optical chopper, a lock-in amplifier and an oscilloscope. The platform is characterized in that various different elastic waves generated by a piezoelectric actuator act on a photoelastic sampling sensor which is independently researched and developed, the sensor generates a photoelastic effect under the action of the elastic waves, and detection of the elastic waves is completed through a photoelastic sampling technology in combination with an elliptical polarization measurement principle. On the basis of ensuring the mutual balance of precision, stability and cost, the method not only can realize the detection and capture of various elastic waves, but also has no special limitation and requirements on the test environment, has a larger extension creation space, can be conveniently combined with other test methods, and the possibility is provided for obtaining more elastic wave feature information.

Description

technical field [0001] The invention belongs to the technical measurement field, in particular to an elastic wave detection technology based on the photoelastic effect. Background technique [0002] Under constant conditions and no external factors, the optical properties of amorphous transparent materials are stable and isotropic without photoelastic effect. The internal transmission path of light is determined by its own refractive index, and the polarized light will not change when it passes through. When an external force is applied to the optical material without damaging it, the elastic deformation will cause it to change from isotropic to anisotropic, and the polarization state will change when polarized light passes through. [0003] At present, there is a problem that the accuracy, stability, and cost cannot be balanced in the existing elastic wave excitation measurement platform construction scheme, and the improvement of accuracy and stability will often lead to a...

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Problems solved by technology

[0003] At present, the existing elastic wave excitation measurement platform construction scheme has the problem of unbalanced accuracy, stability and cost, and the improvement of accuracy and stability will often lead to a substantial increase in cost

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