Gas supply system and gas supply method
A gas supply system and gas path technology, applied in the pipeline system, electrical components, gas/liquid distribution and storage, etc., to achieve the effect of eliminating peaks
Active Publication Date: 2021-10-01
YANGTZE MEMORY TECH CO LTD
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- Application Information
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Problems solved by technology
In the related art, when the process of blowing nitrogen gas to the cleaning machine is performed to dry the wafer, the flow rate of the nitrogen gas flow measured by the mass flow controller will appear random peaks
Method used
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[0025] It should be noted that, in the case of no conflict, the embodiments in the application and the technical features in the embodiments can be combined with each other. Undue Limitation of This Application.
[0026] It should be noted that, in the embodiment of the present application, the peak value is the flow rate that deviates from the set flow rate of the mass flow controller. The peak value can be greater than or less than the set flow rate of the mass flow controller.
[0027] It should be noted that in this embodiment of the application, "maintaining connectivity" and "selective connectivity" are two different concepts. Keeping the connection between the two means that the two remain in the connected state, the state between the two will not switch between connected and cut-off, and there will be no cut-off state between the two. The two are selectively connected, which means that the state between the two will switch between connected and cut-off.
[0028] It ...
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The embodiment of the invention provides a gas supply system and a gas supply method, and belongs to the technical field of semiconductors. The gas supply system comprises a gas source assembly, a first gas path, a mass flow controller, a second gas path and target equipment which are connected in sequence. When the gas source assembly is in a working state, the gas source assembly communicates with the mass flow controller through a first gas path, the mass flow controller communicates with the target equipment through a second gas path, and the first gas path and the second gas path selectively communicate through the mass flow controller. When the gas source assembly is in the working state, the gas source assembly communicates with the mass flow controller through the first gas path, the mass flow controller communicates with the target equipment through the second gas path, and the gas source assembly and the target equipment communicate or cut off through the on-off state of the mass flow controller, so that the disturbance of the opening or closing operation of the pneumatic switch valve to the air flow is avoided, and the peak value is relieved or even eliminated.
Description
technical field [0001] The present application relates to the technical field of semiconductors, in particular to a gas supply system and a gas supply method. Background technique [0002] In the semiconductor cleaning process, the last step of the cleaning machine is generally to blow nitrogen gas to dry the cleaned wafer. In the related art, when the process of blowing nitrogen gas to the cleaning machine to dry the wafer is performed, the flow rate of the nitrogen gas flow measured by the mass flow controller will appear random peaks. Contents of the invention [0003] In view of this, the embodiment of the present application expects to provide a gas supply system and a gas supply method to alleviate the occurrence of peaks. [0004] In order to achieve the above purpose, the first aspect of the embodiment of the present application provides a gas supply system, including a gas source assembly, a first gas circuit, a mass flow controller, a second gas circuit and a ta...
Claims
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Login to View More IPC IPC(8): F17D1/02F17D3/01H01L21/67
CPCF17D1/02F17D3/01H01L21/67
Inventor 张爽郑琨朱熹熊佳瑜陈浩
Owner YANGTZE MEMORY TECH CO LTD