Plasma jet device and method thereof with variable magnetic field confinement
A plasma and jet device technology, applied in the field of ions, can solve the problems of poor plasma jet accuracy, poor microbeam directionality, and single plasma jet generation, and achieves improved accuracy, improved use effects, and reasonable structure settings. Effect
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Embodiment 1
[0045] see figure 1 , 2 , 4, 5, 6, the present invention provides a technical solution: this embodiment provides a plasma jet device with variable magnetic field confinement, which utilizes the upper coil 211a in the first confinement mechanism 210 and the pre-adjustment coil 214 The quantitative relationship between them, the degree of tightness, can achieve a good binding force on the plasma jet, and can control the change of the magnetic field line to realize the change of the control effect of the plasma jet binding force;
[0046] see figure 1 , 2 , the present invention includes a plasma jet device 100, the plasma jet device 100 includes a high-voltage radio frequency generator 102, a gas supply pipe 103 installed on the high-voltage radio frequency generator 102, a flexible tube 104 on the side wall of the high-voltage radio frequency generator 102, and a flexible pipe 104 installed on a flexible The plasma generator 101 at the end of the pipe 104; the ion generator ...
Embodiment 2
[0057] see figure 1 , 3, 4, 5, 6, the present invention provides a technical solution: a plasma jet device 100, a variable start restriction mechanism 200, an adjustment mechanism 300 for adjusting the variable start restriction mechanism 200, and a linkage mechanism of the linkage adjustment mechanism 300 The structure of 400 is the same as that of the linkage mechanism 400 of the plasma jet device 100 and the linkage adjustment mechanism 300 of the first embodiment.
[0058] The difference is that the variable opening constraint mechanism 200 is set as a second constraint mechanism 220; the second constraint mechanism 220 includes an upper flow guide ring 221, a lower flow guide ring 222 with the same specifications located below the upper flow guide ring 221, and the upper flow guide ring 221 It is arranged directly below the central electrode 106, and the upper guide ring 221 and the lower guide ring 222 are both energized correspondingly, and the side wall of the upper g...
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