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PVD part high-pressure washing equipment

A water washing equipment and high-pressure technology, applied to chemical instruments and methods, cleaning methods and utensils, cleaning methods using liquids, etc., can solve problems such as troublesome operation, physical damage to workers, and volatile cleaning solutions to achieve cleaning effects Good, improve cleaning efficiency and avoid human body damage

Inactive Publication Date: 2021-12-21
重庆芯洁科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the defects in the prior art, the object of the present invention is to provide a high-pressure water washing equipment for PVD parts to solve the above-mentioned background technology. Most of the PVD parts adopt traditional manual cleaning, which is cumbersome to operate, and only one PVD carrier plate can be cleaned each time. And it requires multiple people to work together. At the same time, the cleaning solution is volatile, which will cause certain damage to the body of the workers.

Method used

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  • PVD part high-pressure washing equipment

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Embodiment Construction

[0028] The following is further described in detail through specific implementation methods: please refer to Figure 1-10, the present invention provides a high-pressure water washing equipment for PVD parts, including a cleaning box 1, a fixed frame 11, a hydraulic push rod 12, a lifting block 13, a workpiece mounting assembly 2, a gantry frame 3, a screw slide table 4, a connecting plate 41, a water washing Assembly 5, two first support plates 6, two second support plates 7, two first guide rails 8 and two second guide rails 9, the two first support plates 6 are symmetrically arranged on the top outer wall of the cleaning box 1 , the two second support plates 7 are respectively arranged on the two first support plates 6, and one end of the two second support plates 7 is connected with the outer wall of the cleaning box 1, and the two first guide rails 8 are symmetrically arranged on the cleaning box 1 On the inner wall of the cleaning box, two second guide rails 9 are respec...

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Abstract

The invention relates to the technical field of PVD part cleaning, and provides PVD part high-pressure washing equipment which comprises a cleaning box, a fixing frame, a hydraulic push rod, a lifting block, a workpiece mounting assembly, a portal frame, a lead screw sliding table, a connecting plate, a washing assembly, two first supporting plates, two second supporting plates, two first guide rails and two second guide rails. The fixing frame is mounted on the outer wall of the cleaning box, the hydraulic push rod is vertically arranged at the top end of the fixing frame, the lifting block is slidably mounted on the two first guide rails, the top of the lifting block is connected with the output end of the hydraulic push rod, and the workpiece mounting assembly is mounted on the outer wall, away from the fixing frame, of the lifting block. The portal frame is installed on the two second guide rails in a sliding mode, the lead screw sliding table is horizontally arranged at the top of one of the second supporting plates, the two ends of the connecting plate are connected with the moving end of the lead screw sliding table and the portal frame respectively, and the washing assembly is installed at the top end of the portal frame.

Description

technical field [0001] The invention relates to the technical field of cleaning PVD parts, in particular to high-pressure water washing equipment for PVD parts. Background technique [0002] PVD is the English abbreviation of physical vapor deposition, commonly known as "titanium plating" in China. PVD technology refers to the use of physical methods to vaporize the surface of a material source (solid or liquid) into gaseous atoms or molecules, or partially ionize it into ions under vacuum conditions. And through the low-pressure gas (or plasma) process, the technology of depositing a thin film with a certain special function on the surface of the substrate, physical vapor deposition is one of the main surface treatment technologies. [0003] Most of the existing PVD parts use traditional manual cleaning, which is cumbersome to operate. Only one PVD substrate can be cleaned at a time, and multiple people need to work together. At the same time, the cleaning solution is volat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/10B08B3/08B08B3/02B08B13/00
CPCB08B3/10B08B3/08B08B3/02B08B13/00
Inventor 王文彬杨佐东魏航周文刘永勋
Owner 重庆芯洁科技有限公司