Magnetron sputtering coating machine capable of achieving rapid cooling

Abstract

The invention discloses a magnetron sputtering coating machine capable of achieving rapid cooling. The magnetron sputtering coating machine comprises a magnetron sputtering coating machine shell, a threaded column is arranged in the magnetron sputtering coating machine shell, the top end of the threaded column is connected with the inner wall of the top of the magnetron sputtering coating machine shell through a bearing, the threaded column is sleeved with a threaded ring, the threaded ring is connected with the threaded column in a threaded mode, the threaded column is sleeved with a connecting ring, the connecting ring is located below the threaded ring, and a plurality of first connecting plates are arranged on the connecting ring. The magnetron sputtering coating machine capable of achieving rapid cooling belongs to the technical field of coating equipment, a plurality of workpieces can be conveniently fixed, the clamping area of the workpieces can be decreased at the same time, and heat dissipation and cooling are facilitated; and by driving the threaded column to rotate, the positions of the workpieces can be changed, a sputtering device does not need to move, the problem of non-uniform coating can be effectively avoided, and the production efficiency is higher.

Description

technical field [0001] The invention relates to the technical field of coating equipment, in particular to a magnetron sputtering coating machine capable of rapid cooling. Background technique [0002] As an important method in the field of vacuum coating, vacuum magnetron sputtering coating method has a very wide range of applications. Coating substrates include metal, glass, ceramics, plastic films, etc. According to process conditions, various films can be prepared, such as: For functional films such as optical films, decorative films, protective films, and electromagnetic shielding films, the equipment involved in the sputtering device is large and inconvenient to move, which may easily cause uneven coating thickness. Contents of the invention [0003] The main purpose of the present invention is to provide a magnetron sputtering coating machine capable of rapidly cooling down, which can effectively solve the problems in the background technology. [0004] In order to...

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Problems solved by technology

[0002] As an important method in the field of vacuum coating, vacuum magnetron sputtering coating method has a very wide range of applications. Coating substrates include metal, glass, ceramics, plastic films, etc. According to process conditions, various films can be prepared, such as: Optical film, decorative film, protective film, electromagnetic shielding film and other functional films, because the equipment involved in the sputtering device is large in size and inconvenient to move, it is easy to cause uneven coating thickness

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