Large-area preparation method of high-stability high-saturation photonic crystal structure yarn-producing fabric

A photonic crystal, high-stability technology, applied in animal fibers, plant fibers, textiles and papermaking, etc., can solve the problem of reducing structural color saturation, and achieve the consistency of improving stability, high stability and high saturation , the effect of bright structural color

Pending Publication Date: 2022-03-11
ZHEJIANG SCI-TECH UNIV +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this method is that usually the nano-microspheres and water-based polyurethane have a relatively close refractive index, which will reduce the saturation of the structural color
At present, there are few reports on the continuous preparation of large-area photonic crystal structure color-producing fabrics with high structural stability and color saturation.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • Large-area preparation method of high-stability high-saturation photonic crystal structure yarn-producing fabric
  • Large-area preparation method of high-stability high-saturation photonic crystal structure yarn-producing fabric
  • Large-area preparation method of high-stability high-saturation photonic crystal structure yarn-producing fabric

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] A method for preparing a large-area color-producing fabric with a high-stability and high-saturation photonic crystal structure. The steps of the method are as follows:

[0046] (1) Surface modification of textile substrates: Scrape-coat 8 g / m2 of special polymer ① (PUE1401) on the surface of polyester fabric and place it in a heating device to heat and cure at 80°C for 5 minutes to form a film;

[0047] (2) Configure 150nm PS nano-microsphere dispersion (nano-microsphere 15wt%, carbon black 0.02wt%, activator: fatty alcohol polyoxyethylene ether 1wt%, surplus is water), make the dispersion liquid by wire rod induction Uniform distribution on the surface of the fabric with the special polymer layer obtained in (1);

[0048] (3) Place the compound obtained in (2) in a static heating device (temperature 50°C, humidity 50%) for 10 minutes to complete the assembly of nanospheres, the activation and migration of the interface layer, and the stable curing of the entire compou...

Embodiment 2

[0050] A method for preparing a large-area color-producing fabric with a high-stability and high-saturation photonic crystal structure. The steps of the method are as follows:

[0051] (1) Surface modification of textile substrates: 12 g / m2 special polymer (PUE-2013) was prepared on the surface of polyester fabric by film transfer method ① (PUE-2013) was placed in a heating device and heated at 80°C for 90 seconds to form a film;

[0052] (2) configuration 200nm PMMA nano-microsphere dispersion (nano-microsphere 20wt%, carbon black 0.03wt%, activator: polyoxyethylene sorbitan fatty acid ester 2wt%), make the dispersion in ( 1) The surface of the obtained fabric with the special polymer layer is evenly distributed;

[0053] (3) Place the compound obtained in (2) in a continuous hot air heating device (temperature 60°C, humidity 60%) for 7 minutes to complete the assembly of nanospheres, the activation and migration of the interface layer, and the stable curing of the entire com...

Embodiment 3

[0055]A method for preparing a large-area color-producing fabric with a high-stability and high-saturation photonic crystal structure. The steps of the method are as follows:

[0056] (1) Surface modification of textile substrates: Scrape-coat 16 g / m2 special polymer ① (PUE1650) on the surface of cotton fabrics and place in a heating device to heat and cure at 100°C for 3 minutes to form a film;

[0057] (2) configuration 250nm P (St-MMA) nano microsphere dispersion (nano microsphere 30wt%, carbon black 0.05wt%, activator: alkylphenol polyoxyethylene ether 3wt%, surplus is water), by magnetic Rod induction makes the dispersion evenly distributed on the surface of the fabric with special polymer layer obtained in (1);

[0058] (3) Place the compound obtained in (2) in a static heating device (temperature 70°C, humidity 70%) for 5 minutes to complete the assembly of nanospheres, the activation and migration of the interface layer, and the stable curing of the entire compound to ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Abstract

The invention relates to a large-area preparation method of a high-stability and high-saturation photonic crystal structure yarn-producing fabric, which comprises the following steps: S1, surface modification of a textile base material: coating a special high-molecular polymer on the surface of the textile base material, and heating and curing to form a film to obtain a fabric with a high-molecular layer; s2, preparing a nano-microsphere dispersion liquid containing an activating agent, and enabling the nano-microsphere dispersion liquid to be uniformly distributed on the surface of the fabric with the polymer layer obtained in the S1 under the induction action of external force; and S3, heating the compound obtained in the step S2, and finally obtaining the large-area photonic crystal structure yarn-producing fabric. The method provided by the invention can solve the problem that the color saturation and the structural stability of the photonic crystal structure color-producing textile are difficult to obtain at the same time, and solves the difficulties in the development of the photonic crystal structure color-producing textile such as large-area crack-free and large-area rapid assembly.

Description

technical field [0001] The invention relates to a method for preparing a structural color-producing fabric, in particular to a method for preparing a large-area color-producing fabric with a photonic crystal structure with high stability and high saturation, and belongs to the field of structural color-producing fabrics. Background technique [0002] A photonic crystal is a nanomaterial with a periodic dielectric structure, and its most basic feature is that it has a photonic band gap. Due to the existence of the photonic band gap, it can prevent the visible light equivalent to the forbidden band from passing through the photonic crystal, thereby being selectively reflected, forming constructive interference on its surface, thus forming colorful structural colors. The principle of color generation can be based on the Bragg diffraction formula to explain. Its reflection wavelength can change with the effective refractive index of the photonic crystal, the lattice spacing and...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D06M15/233D06M11/74D06M11/79D06M15/263D06M15/53D06M15/564D06M101/06D06M101/10D06M101/32D06M101/38
CPCD06M15/233D06M11/74D06M15/53D06M15/263D06M11/79D06M15/564D06M2101/32D06M2101/06D06M2101/10D06M2101/38
Inventor 邵建中王晓辉唐族平胡敏干高扬刘一嘉
Owner ZHEJIANG SCI-TECH UNIV
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