Process for changing ultimate pressure borne by plane glass after film coating
A technology of extreme pressure and flatness, which is applied in the field of technology that withstands extreme pressure after changing the coating of flat glass. It can solve problems such as fragile quality, reduce the risk of crushing, and achieve the effect of reassuring use.
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Embodiment 1
[0024] A process for changing the ultimate pressure of flat glass after coating, comprising the following steps:
[0025] 1) Process toughened layer: coat a layer of toughened layer on flat glass;
[0026] 2) Soft material layer processing: process a layer of material with relatively soft chemical properties on the tempered layer;
[0027] 3) Processing anti-reflection film system: the film system is processed on the soft material layer by means of ion source assisted coating;
[0028] 4) Plating waterproof material: After the film system is processed, a layer of waterproof material with a thickness of 12~25nm is plated.
[0029] The vitreous body structure obtained by adopting this process is composed of a waterproof material layer, a film system layer, a soft material layer, a toughened layer and a flat glass layer from the outside to the inside.
[0030] Further, in order to better realize the present invention, the following setting method is adopted in particular: In th...
Embodiment 2
[0037] A process for changing the ultimate pressure of flat glass after coating, comprising the following steps:
[0038] 1. The flat glass is coated with a tempered layer first.
[0039] 2. Process a material with relatively soft chemical properties (BP500, Ti 3 o 5 , SiO 2 Any one of them), changing the tension of the entire glass structure, but will not cause the transmittance of the glass structure to change and do not use ion source (RF source) assistance in the process of processing, and compare the chemical properties on the tempered layer When processing soft materials, the electron gun should be set according to the following parameters: BP500: 8mA, Ti 3 o 5 : 360~300mA, SiO2 2 : 6mA.
[0040] 3. After processing the material layer with relatively soft chemical properties, the film system is processed according to the transmission or emission requirements of the entire glass structure. When processing the film system, an ion source (RF source) is used to assist ...
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