Rapid seedling method of paris polyphylla
A fast technology with seven leaves and one flower, applied in the field of plant cultivation, can solve the problems of uneven germination and low germination rate.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0038] The quick seedling-forming method of Aesculus aesculata of the present embodiment comprises the following steps,
[0039] S1, pretreatment: the mature Aesculus esculenta seeds are cleaned, and the outer testa is removed, and placed in a 1% hydrogen peroxide solution for soaking for 5 minutes.
[0040] S2. Stratification treatment: the pretreated seeds were placed at 20° C. under dark conditions for stratification treatment for 40 days.
[0041] S3. Germination: Plant the stratified seeds in wet perlite for germination. During the germination process, the ambient temperature is kept at 22°C, and the photoperiod is 12h·d -1 , with an illumination intensity of 30 μmol m -2 ·s -1 .
[0042] S4. Transfer the germinated seeds with 3-5 mm long radicles to the seedling-forming medium, and culture them at 22° C. to obtain Aesculus aesculus seedlings.
Embodiment 2
[0044] This embodiment includes most of the operational steps of Embodiment 1, and differs from Embodiment 1 in that:
[0045] In this embodiment, before the layering treatment, in step S1, the seeds of Aesculus aesculus were soaked in a 1% hydrogen peroxide solution for 5 minutes, and then the seeds were placed in a 10 mg / L gibberellin solution Soak in medium, 20°C and dark conditions for 48 hours.
Embodiment 3
[0047] This embodiment includes most of the operational steps of Embodiment 1, and differs from Embodiment 1 in that:
[0048] In this embodiment, before the layering treatment, in step S1, the seeds of Aescinus aesculus were soaked in a 1% hydrogen peroxide solution for 5 minutes, and then the seeds were placed in a 50 mg / L gibberellin solution Soak in medium, 20°C and dark conditions for 48 hours.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com