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AFM probe measurement method and device, control equipment and storage medium

A probe measurement and probe technology, which is applied in the field of AFM probes, can solve the problems of not being able to meet the normal use of AFM probes and large measurement deviations, and achieve the effects of meeting normal use, eliminating deviations, and improving accuracy

Active Publication Date: 2022-03-25
THE 13TH RES INST OF CHINA ELECTRONICS TECH GRP CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The embodiment of the present invention provides an AFM probe measurement method, device, control equipment and storage medium to solve the problem that the existing technology will cause large measurement deviations in the AFM measurement results and cannot meet the normal use of the AFM probe

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  • AFM probe measurement method and device, control equipment and storage medium
  • AFM probe measurement method and device, control equipment and storage medium
  • AFM probe measurement method and device, control equipment and storage medium

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Embodiment Construction

[0054]In the following description, specific details such as specific system structures and technologies are presented for the purpose of illustration rather than limitation, so as to thoroughly understand the embodiments of the present invention. It will be apparent, however, to one skilled in the art that the invention may be practiced in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present invention with unnecessary detail.

[0055] In order to make the purpose, technical solution and advantages of the present invention clearer, specific embodiments will be described below in conjunction with the accompanying drawings.

[0056] see figure 1 , which shows a schematic diagram of the influence of the AFM probe provided by the embodiment of the present invention on the linewidth measurement.

[0057] Such as figure 1 As ...

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Abstract

The invention provides an AFM probe measurement method and device, control equipment and a storage medium. The method comprises the following steps: scanning a to-be-measured line by using an AFM probe to obtain a to-be-measured curve of the to-be-measured line; determining a left-side to-be-measured curve and a right-side to-be-measured curve of the to-be-measured line by taking the vertex of the to-be-measured curve as a center; and respectively solving a left AFM probe curve and a right AFM probe curve of the to-be-measured line by taking the transverse resolution of the AFM as a step, and obtaining a real contour of the to-be-measured line according to the left to-be-measured curve, the right to-be-measured curve, the left AFM probe curve and the right AFM probe curve. According to the invention, the measurement accuracy of the AFM probe can be improved.

Description

technical field [0001] The invention relates to the technical field of AFM probes, in particular to an AFM probe measurement method, device, control device and storage medium. Background technique [0002] Atomic Force Microscope (AFM) is an important instrument for analyzing surface topography and electromagnetic properties with atomic resolution. Since the AFM probe cannot be infinitely sharp, the measured image will contain part of the AFM probe information, resulting in image distortion. Due to image distortion, there will be a large measurement deviation when the AFM measures the line width. [0003] In the prior art, the measurement result will be compensated according to the probe parameters provided by the AFM manufacturer. However, the AFM probes used many times will wear out, and the actual probe parameters are inconsistent with the probe parameters provided by the manufacturer, which will eventually lead to large measurement deviations in AFM measurement results...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01Q60/24
CPCG01Q60/24
Inventor 韩志国李锁印邹学峰张晓东赵琳吴爱华许晓青
Owner THE 13TH RES INST OF CHINA ELECTRONICS TECH GRP CORP