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Gas cleaning device and hydrogen production system

A technology for gas cleaning and tank cleaning, which is applied in gas treatment, using liquid contact hydrogen separation, hydrogen separation, etc., can solve problems such as gas embolism easily appearing at the mouth of the liquid replenishment pipe, affecting the normal operation of the gas cleaning device, etc.

Active Publication Date: 2022-06-03
阳光氢能科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In view of this, the present invention provides a gas cleaning device and a hydrogen production system to solve the problem that gas plugs are prone to occur at the liquid replenishment nozzle in the cleaning tank and affect the normal operation of the gas cleaning device

Method used

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  • Gas cleaning device and hydrogen production system
  • Gas cleaning device and hydrogen production system
  • Gas cleaning device and hydrogen production system

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Embodiment Construction

[0030] The core of the present invention is to provide a gas cleaning device and a hydrogen production system, so as to solve the problem that gas embolism easily occurs in the liquid replenishment pipe opening in the cleaning tank, which affects the normal operation of the gas cleaning device.

[0031] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0032] see figure 1 and figure 2 , the embodiment of the present invention provides a gas cleaning device, including a cleaning tank 1, a...

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Abstract

The invention discloses a gas cleaning device and a hydrogen production system, the gas cleaning device comprises a cleaning tank body, a gas introduction assembly extending below the liquid level in the cleaning tank body and a liquid supplementing pipe orifice located below the liquid level in the cleaning tank body, the periphery of the liquid supplementing pipe orifice is provided with a protective plate, and the protective plate is at least partially blocked between the gas introduction assembly and the liquid supplementing pipe orifice. According to the gas cleaning device, in the actual application process, cleaning liquid can be supplemented into the cleaning tank body through the liquid supplementing pipe opening, the protection plate is arranged on the periphery of the liquid supplementing pipe opening, and at least part of the protection plate is blocked between the gas introduction assembly and the liquid supplementing pipe opening, so that bubbles generated by exhaust of the gas introduction assembly are prevented from entering the liquid supplementing pipe opening through the protection plate, and the cleaning liquid is completely supplemented. Therefore, the problem that normal operation of the gas cleaning device is affected due to the gas embolism phenomenon at the liquid supplementing pipe opening can be avoided.

Description

technical field [0001] The present invention relates to the technical field of gas processing equipment, and more particularly, to a gas cleaning device and a hydrogen production system. Background technique [0002] The gas cleaning device is a common chemical equipment. Its working principle is as follows: after the gas to be cleaned passes through the liquid inside the cleaning device, the liquid-soluble components entrained in the gas to be cleaned are absorbed by the liquid, thereby obtaining a clean gas. [0003] Taking the hydrogen production system as an example, under the background of double carbon emission reduction, the process of producing hydrogen from alkaline water is gradually popularized by the public. Use a gas cleaning device for treatment. [0004] Generally speaking, the gas cleaning device includes a cleaning tank body, a gas introduction component extending below the liquid level in the cleaning tank body, and a liquid replenishing nozzle. During the...

Claims

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Application Information

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IPC IPC(8): B01D53/18C01B3/52C25B1/02C25B15/08
CPCB01D53/18C01B3/52C25B1/02C25B15/08C25B15/083B01D2256/16Y02E60/36
Inventor 孟欣李志平邓强陈明星
Owner 阳光氢能科技有限公司
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