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Surface adsorption and spontaneous polymerization process of extra-thin polymer film

A polymer film and surface adsorption technology, applied in the field of surface adsorption spontaneous polymerization technology to prepare ultra-thin polymer ordered films, can solve the problems of high process requirements, holes in organic films, poor film surface flatness, etc., and achieve huge applications The effect of value, easy mass production, and convenient operation

Inactive Publication Date: 2005-01-26
FUDAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this film-making method cannot be used to prepare structurally ordered films, nor can it be used to prepare extremely thin polymer films, which will produce many "holes" and "islands" in the preparation of ultra-thin polymer films. shape structure, the flatness of the film surface is very poor
[0006] LB film technology can also be used to make quasi-two-dimensional organic thin films. The use of LB film technology is a major advancement, but LB film technology also has many defects, such as high process requirements, easy introduction of impurities, poor stability of the film, and the same existence of organic films. Hole", can not fully meet the requirements

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] The pure styrene monomer is added dropwise on the surface of the newly exfoliated highly oriented pyrolytic graphite (HOPG), the styrene monomer spreads on the graphite surface to form a monomer film, and the styrene monomer continues to evaporate in the atmosphere. Put this sample in a dark container and let it stand naturally for several days to several weeks, and an ultrathin polystyrene ordered film is formed on the graphite surface.

Embodiment 2

[0039] On the freshly exfoliated HOPG surface, neat acrylic monomer was added dropwise to form a monomer film. After the sample was evaporated under reduced pressure in a vacuum chamber for several hours, and then placed in a dark box for several weeks, an ordered ultrathin polyacrylic acid film was formed on the graphite surface.

Embodiment 3

[0041] A small amount of acrylic monomer is placed at the bottom of a closed container, and the mica sheet is placed on top of the acrylic monomer. The volatilized acrylic acid gas is adsorbed on the surface of the mica sheet to form a film. After a few hours, take out the mica sheet and leave it for several days to several weeks to form a polyacrylic film on the surface of the mica sheet.

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Abstract

The present invention belongs to the field of film preparation, and relates to especially surface adsorption and spontaneous polymerization process of preparing extra-thin polymer film. On the surface of substrate of solid with lattice structure, ultra-thin organic monomer film is first formed and then polymerized to form the polymer film. The said preparation process can form large-area ultra-thin ordered polymer film, and when proper substrate-monomer system is used, quasi-2D ordered polymer film of the thickness of several molecules or even single molecule may be prepared.The said ultra-thin ordered polymer film may be used as substrate and medium for photoelectronic functional devices, and has huge application value in nano electronic device, molecular electronic device, single electronic device and quantum electronic device.

Description

technical field [0001] The invention belongs to the technical field of thin film preparation and the technical field of quasi-two-dimensional functional polymer medium thin film, and specifically relates to a method for preparing ultrathin polymer ordered thin film by surface adsorption spontaneous polymerization technology. technical background [0002] Thin film preparation technology is one of the core technologies in material science, and is directly related to the development of modern technology and microelectronics technology. For example: monocrystalline silicon and its related thin film preparation technology have greatly promoted the development of the semiconductor industry; molecular beam epitaxy (MBE) technology and metal organic chemical vapor deposition (MOCVD) technology have greatly improved the structure and performance of thin films, thus The application range of semiconductor technology is widened, and the performance of devices is improved. Therefore, t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08J5/18
Inventor 徐伟华中一
Owner FUDAN UNIV
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