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Photo sensitive composition and negative lithographic printing plate

A photosensitive composition and resin technology, applied in lithographic printing equipment, printing, printing technology, etc., can solve the problems of photosensitive layer film strength and storage stability, and achieve excellent printing resistance and storage stability, and high practicality Excellent performance and film strength

Inactive Publication Date: 2006-12-06
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] In particular, as a recording material for a lithographic printing plate, it is necessary to have high film strength from the viewpoint of printing durability. However, it is a difficult problem to balance the film strength and storage stability of the photosensitive layer. Have not yet achieved fully satisfying results and are looking for new technologies that do not currently exist

Method used

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  • Photo sensitive composition and negative lithographic printing plate
  • Photo sensitive composition and negative lithographic printing plate
  • Photo sensitive composition and negative lithographic printing plate

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0431] Synthesis Example 1: Compound P-1

[0432] In a flask, mix monomer A-1 (0.8 mol), methacrylic acid (0.2 mol), V-65 (manufactured by Wako Pure Chemical Industries, Ltd., an azo thermal polymerization initiator) (0.03 mol), N,N-di Methylacetamide (1 L), stirred at 70°C for 5 hours. After the reaction, the reaction solution was slowly added into 5 L of water while stirring, and a white powder was precipitated. The powder was filtered and dried to obtain P-1 in 90% yield. The structure of this substance was confirmed by NMR, IR, and GPC.

Synthetic example 2

[0433] Synthesis Example 2: Compound P-8

[0434] Mix A-81 (0.6 mol), acrylic acid (0.4 mol), V-65 (manufactured by Wako Pure Chemical Industries, Ltd., azo-based thermal polymerization initiator) (0.02 mol), and N,N-dimethylacetamide in a flask (1 L), stirred at 70°C for 5 hours. After the reaction, the reaction solution was slowly added into 5 L of water while stirring, and a white powder was precipitated. The powder was filtered and dried to afford P-9 in 85% yield. The structure of this substance was confirmed by NMR, IR, and GPC.

Synthetic example 3

[0435] Synthesis Example 3: Compound P-16

[0436] Mix A-17 (0.5 mol), methacrylic acid (0.3 mol), benzyl acrylate (0.2 mol), V-65 (manufactured by Wako Pure Chemical Industries, Ltd., azo thermal polymerization initiator) (0.03 mol) in a flask ), N,N-dimethylacetamide (1L), stirred at 70°C for 5 hours. After the reaction, the reaction solution was slowly added into 5 L of water while stirring, and a white powder was precipitated. The powder was filtered and dried to obtain P-16 in a yield of 90%. The structure of this substance was confirmed by NMR, IR, and GPC.

[0437] As described above, all the polymers shown in the specific examples can be synthesized.

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Abstract

A photosensitive composition comprising a resin containing a repeating unit corresponding to a monomer having a structure represented by formula (I) defined in the specification, and a negative working lithographic printing plate having a negative working photosensitive layer comprising the above-described photosensitive composition.

Description

technical field [0001] The present invention relates to a photosensitive composition and a negative-working lithographic printing plate suitable for the production of lithographic printing plates, IC circuits, photomasks, and the like. In particular, it relates to a so-called photocrosslinkable photosensitive composition and a negative-working lithographic printing plate suitable for use as a plate material for a lithographic printing plate capable of direct plate making, which are directly plate-making from digital signals of a computer or the like using various lasers. Background technique [0002] Solid-state lasers, semiconductor lasers, and gas lasers that emit ultraviolet light, visible light, or infrared light with a wavelength of 300nm to 1200nm can be easily obtained with high output power and compact size. Documenting light sources is very useful. [0003] Various studies have been conducted on these laser light-sensitive recording materials, representative ones a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/038B41C1/10B41M5/36C08F20/00C08F24/00C08F26/00C08F28/00C08F30/00G03F7/00G03F7/021G03F7/033
CPCG03F7/033G03F7/0388Y10S430/165Y10S430/145G03F7/0212Y10S430/146G03F7/038B41C1/1008B41C1/1016B41C2201/02B41C2201/04B41C2201/14B41C2210/04B41C2210/06B41C2210/22B41C2210/24
Inventor 国田一人
Owner FUJIFILM CORP