An etching process

A technology of etching and etching solution, which is applied in the manufacture of electrical components, semiconductor/solid-state devices, circuits, etc., can solve problems such as uneven etching, unsteady maintenance of oxalic acid concentration, and influence on process effects, so as to ensure stable progress.

Inactive Publication Date: 2004-08-25
AU OPTRONICS CORP
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Problems solved by technology

[0005] Because it is known that the acid-base titration is used to measure the concentration of the solution for too long, even if the concentration is found to be abnormal after the concentration of the solution is measured, and water needs to be added to the etching solution to return the concentration of the etching solution to the normal range, however due to the The concentration of oxalic acid may be changed again due to the volatilization of water in the process of determining the concentration of the solution. Therefore, the method of determining the concentration of the solution by acid-base titration cannot provide an effective inline monitor, so that the concentration of oxalic acid cannot be maintained stably. Within the predetermined concentration range, and lead to uneven etching, affecting the effect of the entire process

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Embodiment Construction

[0012] In a preferred embodiment of the present invention, a liquid crystal display panel is first provided, which includes a glass substrate, a transparent conductive layer is provided on the surface of the substrate, and a mask layer is covered on the surface of the transparent conductive layer to define the pattern of the pixel electrode . Then soak the glass substrate in the oxalic acid etchant, use a conductivity meter to detect the conductivity of the oxalic acid etchant, and adjust the concentration of oxalic acid according to the conductivity, so that its concentration is maintained in a predetermined range, so as to use the oxalic acid etchant to remove impurities. The transparent conductive layer covered by the mask layer defines the pixel electrode. Wherein the material of the transparent conductive layer is indium tin oxide (ITO), and the concentration of the oxalic acid etchant is maintained at about 3.4 wt%.

[0013] Since in the ITO etching process, except for ...

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Abstract

The invention is a kind of light mantle for contact window process, the mantle has a contact window pattern, and there has a border pattern on edge of the contact window pattern, the border pattern is a semi-exposure area. Because that the border of contact window pattern is semi-exposure pattern, the contact angle between the side wall of aperture of contact window which is patterned and the conducting layer under it can be reduced.

Description

technical field [0001] The invention provides an etching method for a transparent conductive layer of a liquid crystal display panel, especially an etching method that uses a conductivity meter to detect the conductivity of an oxalic acid etching solution, and uses a water adding system to replenish water to control the concentration of the oxalic acid etching solution . Background technique [0002] Among the components of a liquid crystal display, pixel electrodes play a pivotal role in the color performance of the display. In the manufacturing process of the liquid crystal display panel, the fabrication of the pixel electrode is to use the wet etching technology to cover the transparent conductive layer on the substrate with a mask layer, such as a transparent conductive layer composed of indium tin oxide (indium tin oxidized, ITO), and then The substrate is immersed in an etching solution to remove the transparent conductive layer on the substrate not covered by the mas...

Claims

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Application Information

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IPC IPC(8): G03F7/26G03F7/42H01L21/3205
Inventor 陈庆仁
Owner AU OPTRONICS CORP
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