Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Particle source with selectable beam current and energy spread

A particle source and charged particle technology, applied in radiation/particle processing, circuits, discharge tubes, etc., can solve problems such as loose particle source structure

Active Publication Date: 2005-08-24
FEI CO
View PDF0 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] The existing particle source structure is relatively loose

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Particle source with selectable beam current and energy spread
  • Particle source with selectable beam current and energy spread
  • Particle source with selectable beam current and energy spread

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] figure 1 The particle source of the present invention is schematically shown in section. A particle emission surface (for example an electron emission surface of an electron field emission source) 1 is located on an optical axis 2 . The electron beam 11 emitted from the electron emitting surface 1 is divided into a central particle beam 12 and an eccentric particle beam 13 by the diaphragm 3 having circular beam-limiting diaphragm openings 4 and 5 . Both particle beams 12 and 13 are focused by a lens 6 arranged on the optical axis 2 . The electron-emitting surface 1 is imaged by the lens 6 , the electron-emitting surface 1 forms an image 14 via the particle beam 12 and an image 15 via the particle beam 13 . The energy selection diaphragm opening 9 is located on the diaphragm 7, and a cutout 8 is also provided on the diaphragm 7 to allow the central particle beam 12 to pass through. In the vicinity of the position where the particle beam 13 passes the optical axis, a ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this image 15 onto a diaphragm 7, it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10, this particle beam 16 can be deflected toward the optical axis 2. One can also elect to deflect a beam 12 going through the middle of the lens 6 - and having, for example, greater current - toward the optical axis.

Description

technical field [0001] The invention relates to a particle-optical device provided with a particle source realized for generating at least one beam of charged particles, the particle source being provided with: [0002] a particle emitting surface for emitting charged particles; [0003] a lens to form an image of the surface from which the particles are emitted; [0004] a beam limiting diaphragm for confining the particle beam; and [0005] An energy selective diaphragm located at the image. Background technique [0006] S.Uhlemann and M.Haide published "For 200kv TEM" in the Proceedings of the "Fifteenth International Congress of Electron Microscopy" Conference 5 / S14 held in Durban, South Africa from September 1 to 6, 2002. "Experimental setup of an all-electrostatic monoenergizer" describes such a particle source for use in a particle-optical setup. [0007] The particle beam described in this document has the form of an electron source, which can be used in devices ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G21K1/00G21K1/02H01J37/05H01J37/09H01J37/153H01J37/26
CPCH01J37/09H01J37/26H01J37/153H01J37/05
Inventor J·奇梅里克A·亨斯特拉
Owner FEI CO
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com