Electronic holographic display device
A technology of electronic holography and display devices, applied in instruments, optical components, optics, etc., can solve the problems of huge amount of image information, barriers to display resolution, etc., and achieve good transparency and significant electro-optic effects
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specific Embodiment approach 1
[0025] Specific implementation mode 1: Transmissive ultra-high resolution electronic holographic display device
[0026] image 3 It is a schematic diagram of a transmissive electronic holographic display device manufactured according to the technical solution of the present invention. A 100 nm thick ITO film was deposited by sputtering on the fused silica substrate 310 and carved into strip patterns with a width of 0.8 microns and a pitch of 0.2 microns as the bottom electrode 320 . Then a nano-PLZT (lanthanum-doped lead zirconate titanate) thin film 340 with a thickness of 500 nm and an average grain size of 60 nm is prepared thereon. Finally, a transparent ITO film is deposited and etched to form upper electrodes 330 with a width of 0.8 microns and a pitch of 0.2 microns. This constitutes a transmissive electro-holographic display device 300 . By controlling the voltage of each pixel point on the holographic display device through the computer interface and the driving c...
specific Embodiment approach 2
[0027] Specific implementation mode two: reflective ultra-high resolution electronic holographic display device
[0028] Figure 4 It is a schematic diagram of a reflective electronic holographic display device manufactured according to the technical solution of the present invention. After the silicon substrate 310 is thermally oxidized, a Pt / Ti film with a thickness of 50 nanometers is deposited by sputtering and carved into strip patterns with a width of 0.8 microns and a pitch of 0.2 microns as the row electrodes 320 . Then a nano SBN (strontium barium niobate) film 340 with a thickness of 600 nanometers and an average grain size of 80 nanometers is prepared thereon. Finally, a transparent ITO film is deposited and etched to form column electrodes 330 with a width of 0.8 microns and a pitch of 0.2 microns. This constitutes a reflective ultra-high resolution (1000 lines / mm) electronic holographic element 300 . By controlling the voltage of each pixel point on the hologra...
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