Mask for glass etching and its use for glass etching

A mask and glass technology is applied in the application field of etching the glass back cover of an organic electroluminescent display device, and achieves the effects of convenient use, low price and high groove precision
CN1891652AInactive Publication Date: 2007-01-10SHENZHEN TCL IND RES INST
0 Cites 10 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SHENZHEN TCL IND RES INST
Publication Date
2007-01-10
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

This invention relates to a new type of mask used in glass etching and its application in it, in which, said new mask includes at least two layers of structures, one is mask material, the other is a glue layer, the mask material is placed above the glue layer and connected with an etched glass via the glue layer, said new mask can be bond on the etched glass stably and not easy to be corroded by acid and the mask is fixed in the etching of glasses.
Need to check novelty before this filing date? Find Prior Art

Description

Technical field

[0001] The invention relates to a new type of mask material and its application in the glass etching process, especially in etching the glass back cover of an organic electroluminescence display device. Background technique

[0002] With the development of multimedia technology and the improvement of people's quality of life, in the display technology, the requirements for the performance of the flat panel display are getting higher and higher. Organic electroluminescent display, as a new type of flat panel display, has a series of advantages such as autonomous light emission, low-voltage DC drive, full curing, wide viewing angle, fast response speed, and rich colors. It is recognized as the main force of next-generation displays. Army, its light-emitting principle is to deposit a very thin organic light-emitting material between two electrodes, by applying direct current to the organic light-emitting material to make it emit light.

[0003] However, since organic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More