Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask for glass etching and its use for glass etching

A mask and glass technology is applied in the application field of etching the glass back cover of an organic electroluminescent display device, and achieves the effects of convenient use, low price and high groove precision

Inactive Publication Date: 2007-01-10
SHENZHEN TCL IND RES INST
View PDF0 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

That is to say, the same problem exists not only for etching the glass back cover of organic electroluminescent display devices, but also for other glass etching.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask for glass etching and its use for glass etching
  • Mask for glass etching and its use for glass etching
  • Mask for glass etching and its use for glass etching

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] The manufacturing method of the glass back cover adopting the present invention will be further described in detail with reference to the attached schematic diagram.

[0034] The present invention adopts the following technical scheme: by using a new material 2 mask to etch a groove 10 with a uniform depth and a flat bottom on the flat glass, the manufacture of the back cover of the device packaging glass is completed. The process method of etching the groove on the flat glass to make the glass back cover includes the following steps:

[0035] A. Cut out the glass plates of the required size for cleaning;

[0036] The size is selected according to needs. You can select a single glass plate that only needs to be etched locally, such as a single glass back cover, or multiple, such as forming a whole glass plate with multiple divisions on it. Glass back cover; after cleaning, it is dried to facilitate bonding with the new mask;

[0037] B. Stick the new mask material evenly on...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

This invention relates to a new type of mask used in glass etching and its application in it, in which, said new mask includes at least two layers of structures, one is mask material, the other is a glue layer, the mask material is placed above the glue layer and connected with an etched glass via the glue layer, said new mask can be bond on the etched glass stably and not easy to be corroded by acid and the mask is fixed in the etching of glasses.

Description

Technical field [0001] The invention relates to a new type of mask material and its application in the glass etching process, especially in etching the glass back cover of an organic electroluminescence display device. Background technique [0002] With the development of multimedia technology and the improvement of people's quality of life, in the display technology, the requirements for the performance of the flat panel display are getting higher and higher. Organic electroluminescent display, as a new type of flat panel display, has a series of advantages such as autonomous light emission, low-voltage DC drive, full curing, wide viewing angle, fast response speed, and rich colors. It is recognized as the main force of next-generation displays. Army, its light-emitting principle is to deposit a very thin organic light-emitting material between two electrodes, by applying direct current to the organic light-emitting material to make it emit light. [0003] However, since organic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
Inventor 付东谢相伟孙贤文曾乾徐建坤叶朝滢
Owner SHENZHEN TCL IND RES INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products