Stacked storage capacitor structure, ltps TFT-lcd
A capacitor structure, thin film transistor technology, applied in transistors, instruments, circuits, etc., can solve the problems of image retention, flicker, light interference, etc., and achieve the effects of increasing storage capacity, simplifying processes, and reducing costs
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
no. 1 example
[0028] 2A is a top view of a pixel of a low-temperature polysilicon thin film transistor liquid crystal display according to the first preferred embodiment of the present invention, and a stacked storage capacitor structure is formed in the pixel. 2E is a sectional view taken along the section line B-B' of the pixel shown in FIG. 2A; FIGS. 2B to 2E are process sectional views illustrating the stacked storage capacitor structure. FIG. 2F is an equivalent circuit diagram illustrating the pixel shown in FIG. 2A .
[0029] As shown in FIG. 2A , a pixel 20 has a stacked storage capacitor structure, a thin film transistor 24 , and a pixel electrode 240 formed above. Wherein, the above-mentioned stacked storage capacitor structure includes a first storage capacitor (C st ) 22 and the second storage capacitor (C st’ )29. A signal line 26 and a gate line 28 intersect near the thin film transistor 24 and are arranged around the pixel 20 . The above-mentioned second storage capacitor...
no. 2 example
[0037] 3A is a top view of a pixel of a low-temperature polysilicon thin film transistor liquid crystal display according to a second preferred embodiment of the present invention, and a stacked storage capacitor structure is formed in the pixel. 3G is a cross-sectional view taken along the section line C-C' of the pixel shown in FIG. 3A; FIGS. 3B to 3G are cross-sectional views illustrating the process of the stacked storage capacitor structure.
[0038] As shown in FIG. 3A , a pixel 30 has a stacked storage capacitor structure, a thin film transistor 34 , and a pixel electrode 340 formed above. Wherein, the above-mentioned stacked storage capacitor structure includes a first storage capacitor (C st ) 32 and the second storage capacitor (C st’ )39. A signal line 36 and a gate line 38 intersect near the thin film transistor 34 and are arranged around the pixel 30 . The above-mentioned second storage capacitor (C st’ ) 39 is placed in the above-mentioned first storage capac...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 