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A method for preventing or reducing contamination of an immersion type projection appartus and an immersion type lithographic apparatus

A kind of projection equipment and immersion technology, which is applied in the direction of optomechanical equipment, microlithography exposure equipment, and original parts for optomechanical processing, and can solve undesired and unpredictable problems

Active Publication Date: 2007-06-20
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This requires additional or more powerful motors, and eddy currents in the liquid can lead to undesired and unpredictable effects

Method used

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  • A method for preventing or reducing contamination of an immersion type projection appartus and an immersion type lithographic apparatus
  • A method for preventing or reducing contamination of an immersion type projection appartus and an immersion type lithographic apparatus
  • A method for preventing or reducing contamination of an immersion type projection appartus and an immersion type lithographic apparatus

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Embodiment Construction

[0022] In this application, the same or similar features are generally indicated by the same or similar reference numerals.

[0023] Figure 1 schematically shows a projection device 1 according to an embodiment of the invention.

[0024] According to one embodiment of the invention, the apparatus 1 is a lithographic apparatus and is arranged to project onto the substrate W a pattern from the patterning means MA.

[0025] The device comprises: an illumination system (illuminator) IL for conditioning the radiation beam B (eg UV radiation or other radiation); for supporting a composition device (eg a mask) MA and connected to precisely positioning the composition device according to certain parameters A support structure (eg, mask table) MT of a first positioner PM; holding a substrate (eg, a resist-coated wafer) W and connected to a second positioner PW that precisely positions the substrate according to certain parameters a substrate table (eg, wafer table) WT; and a projectio...

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PUM

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Abstract

The invention discloses a method for preventing or reducing contamination of an immersion type projection apparatus. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.

Description

technical field [0001] The present invention relates to a method of preventing or reducing contamination of an immersion projection apparatus. The invention also relates to an immersion lithography apparatus. Background technique [0002] A well-known projection apparatus is a lithographic apparatus. A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic apparatuses may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, which may be referred to as a mask, a reticle, may be used to create a circuit pattern to be formed on a single layer of the IC. The pattern can be transferred onto a target portion (eg, including a portion comprising a portion, one, or more dies) on a substrate (eg, a silicon wafer). The pattern is typically transferred by imaging on a layer of radiation-sensitive material (resist) provided on the substrate. Typical...

Claims

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Application Information

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IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/70341G03F1/82G03F7/70916G03F7/70925
Inventor J·C·范德霍文
Owner ASML NETHERLANDS BV