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A method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus

A kind of projection equipment and immersion technology, which is applied in the field of immersion lithography equipment, can solve problems such as unpredictable and undesired

Active Publication Date: 2012-09-05
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This requires additional or more powerful motors, and eddy currents in the liquid can lead to undesired and unpredictable effects

Method used

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  • A method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
  • A method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
  • A method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus

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Embodiment Construction

[0022] In the present application, identical or similar features are generally indicated by identical or similar reference numerals.

[0023] figure 1 A projection device 1 according to an embodiment of the present invention is schematically shown.

[0024] According to one embodiment of the invention, the apparatus 1 is a lithographic apparatus and is arranged to project a pattern onto a substrate W from a patterning device MA.

[0025] The apparatus comprises: an illumination system (illuminator) IL for conditioning a radiation beam B (e.g. UV radiation or other radiation); for supporting a patterning device (e.g. a mask) MA and connected to precisely position the patterning device according to specific parameters The support structure (e.g., mask table) MT of the first positioner PM; the support structure (e.g., mask table) MT of the first positioner PM; the support structure (e.g., a resist-coated wafer) W that holds the substrate (e.g., a resist-coated wafer) W and is co...

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PUM

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Abstract

The invention discloses a method for preventing or reducing contamination of an immersion type projection apparatus. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.

Description

technical field [0001] The present invention relates to a method for preventing or reducing contamination of an immersion projection device. The invention also relates to an immersion photolithography apparatus. Background technique [0002] A well known projection apparatus is a lithographic apparatus. A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, which may be called a mask, reticle, may be used to create the circuit pattern to be formed on the single layer of the IC. The pattern can be transferred to a target portion (eg, comprising a portion, one, or more dies) on a substrate (eg, a silicon wafer). The pattern is usually transferred by imaging onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate incl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/70341G03F1/82G03F7/70916G03F7/70925
Inventor J·C·范德霍文
Owner ASML NETHERLANDS BV