Structure for preventing salicide bridging and method thereof
a technology of structure and bridging, applied in the direction of semiconductor devices, basic electric elements, electrical appliances, etc., can solve the problems of increasing the resistance of word lines, reducing the speed of lines, and reducing the speed of memory i
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0001] 1. Field of the Invention
[0002] This invention pertains in general to a semiconductor device and, more particularly, to a structure for preventing salicide bridging in a semiconductor device and a method thereof.
[0003] 2. Background of the Invention
[0004] In modern memory integrated circuits ("ICs"), an important consideration is the speed that stored data may be read or retrieved. Such speed depends partly on the speed of word lines. In the semiconductor industry's continued effort to reduce feature sizes of ICs, the width of word lines is also reduced. Such a reduction leads to an increase in the resistance of the word lines. As is known, higher resistance on a word line reduces its speed, which, in turn, reduces the speed of the memory IC. In order to fabricate high performance ICs, low resistivity on the word line is therefore critical.
[0005] In conventional metal-oxide semiconductor ("MOS") ICs, polysilicon is often used as the gate material. The conductivity of polysili...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


