Thin Film Interference Filter and Bootstrap Method for Interference Filter Thin Film Deposition Process Control

Abstract

A thin film interference filter system includes a plurality of stacked films having a determined reflectance; a modeled monitor curve; and a topmost layer configured to exhibit a wavelength corresponding to one of the determined reflectance or the modeled monitor curve. The topmost layer is placed on the plurality of stacked films and can be a low-index film such as silica or a high index film such as niobia.

Description

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AI Technical Summary

Benefits of technology

The present invention is about a way to make a layered, thin film interference filter. It uses a method called bootstrap to estimate the properties of the filter as layers are deposited. This method allows the user to focus on a single layer and ignore errors in the rest of the film stack. By fitting the single-layer model to the observed spectra of the film stack, the remaining layers can be accurately updated for continued deposition. The technical effect is that it provides a way to make filters with greater accuracy and efficiency.

Problems solved by technology

The patent text discusses the manufacturing of thin film interference filters, which can be used for optical computing and other applications. However, current methods have limitations in accurately modeling the detailed structure of the film stack and the resulting spectra can be affected by small variations in deposition conditions. The technical problem addressed in the patent text is to create a thin film interference filter that is easier to manufacture and has precise rejection bands and passbands.

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