Apparatus and method for combinatorial plasma distribution through a multi-zoned showerhead
a showerhead and plasma distribution technology, applied in the direction of chemical vapor deposition coating, electric discharge tubes, coatings, etc., can solve the problems of long manufacturing time, high cost of showerhead assemblies, add to the cost and complexity of development activities, etc., to facilitate the use of hpc methods, prevent cross-contamination, cost effective and timely
Inactive Publication Date: 2012-12-13
INTERMOLECULAR
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[0008]In some embodiments of the present invention, showerhead assemblies are described that allow the testing of different process parameters and different hardware details on multiple site isolated regions of a single substrate. The showerhead assemblies allow the use of plasma based processes wherein the plasma is confined to isolated regions within the chamber to prevent cross-contamination between adjacent process regions. In some embodiments of the present invention, showerhead assemblies are described that are configurable and allow the
Problems solved by technology
Showerhead assemblies are costly and have a long manufacturing time.
Th
Method used
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[0028]A detailed description of one or more embodiments is provided below along with accompanying figures. The detailed description is provided in connection with such embodiments, but is not limited to any particular example. The scope is limited only by the claims and numerous alternatives, modifications, and equivalents are encompassed. Numerous specific details are set forth in the following description in order to provide a thorough understanding. These details are provided for the purpose of example and the described techniques may be practiced according to the claims without some or all of these specific details. For the purpose of clarity, technical material that is known in the technical fields related to the embodiments has not been described in detail to avoid unnecessarily obscuring the description.
[0029]FIG. 1 illustrates a schematic diagram, 100, for implementing combinatorial processing and evaluation using primary, secondary, and tertiary screening. The schematic dia...
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Abstract
A multi-zone, combinatorial, single wafer showerhead is used to concurrently develop hardware, materials, unit processes, and unit process sequences. The multi-zone, combinatorial, single wafer showerhead utilizes showerhead pucks to perform process sequences on isolated regions of a single substrate. The showerhead pucks are designed so that they are easily interchangeable to allow the characterization of the interaction between hardware characteristics, process parameters, and their influence on the result of the process sequence.
Description
FIELD OF THE INVENTION[0001]The present invention relates generally to thin film deposition using plasma based processes, and, more particularly, to thin film deposition using combinatorial processing.BACKGROUND OF THE INVENTION[0002]The manufacture of integrated circuits (IC), semiconductor devices, flat panel displays, optoelectronics devices, data storage devices, magneto-electronic devices, magneto-optic devices, packaged devices, and the like entails the integration and sequencing of many unit processing steps. As an example, IC manufacturing typically includes a series of processing steps such as cleaning, surface preparation, deposition, lithography, patterning, etching, planarization, implantation, thermal annealing, and other related unit processing steps. The precise sequencing and integration of the unit processing steps enables the formation of functional devices meeting desired performance metrics such as speed, power consumption, and reliability.[0003]As part of the di...
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Login to View More IPC IPC(8): C23C16/455C23C16/52C23C16/50C23C16/458
CPCC23C16/04H01J37/32449C23C16/45565C23C16/45574C23C16/5096C23C16/52B01J2219/0043B01J2219/00443B01J2219/00527B01J2219/00585B01J2219/00596B01J2219/00603B01J2219/00659H01J37/3244C23C16/45519
Inventor ENDO, RICHARDCHILD, KENT RILEY
Owner INTERMOLECULAR