Transparent conductive electrodes comprising merged metal nanowires, their structure design, and method of making such structures
a technology of metal nanowires and transparent electrodes, applied in the direction of dielectric characteristics, printed circuit non-printed electric components association, instruments, etc., can solve the problems of brittleness of ito films, low throughput, and high cost of vacuum deposition process,
Inactive Publication Date: 2015-07-23
NUOVO FILM SUZHOU CHINA INC
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Problems solved by technology
Indium tin-oxide (ITO) is traditionally widely used as a transparent conductor in transparent electrodes in science and research community, but it also has well drawbacks in large scale manufacturing processes.
First, in order to make electrodes, ITO is vacuum deposited onto substrates, and the vacuum deposition process is expensive and low throughput.
Second, in most of applications, 150 nm or thicker of ITO is needed to ensure electrical performance, but at such thicknesses, ITO films become brittle making them not feasible for applications requiring large areas or flexible substrates.
Third, to achieve good conductivity and clarity, ITO films need to be annealed at high temperatures, preferably over 200 C, thus limiting its application on high temperature resistant substrates such as glass.
Due to the low softening point of polymers, most polymer based ITO film
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The present invention discloses transparent conductive electrodes comprising merged metal nanowires and the method of making the same. The merged nanowire junctions have junction depth less than the combination of the diameters of the individual metal nanowires.
Description
TECHNICAL FIELD OF THE DISCLOSURE[0001]This present patent application relates, in general, to the art of transparent electrodes, including their structures and method of making, and more particularly, to the art of fabricating transparent electrodes having a network of metal nanowires with merged junctions.BACKGROUND OF THE DISCLOSURE[0002]Indium tin-oxide (ITO) is traditionally widely used as a transparent conductor in transparent electrodes in science and research community, but it also has well drawbacks in large scale manufacturing processes. First, in order to make electrodes, ITO is vacuum deposited onto substrates, and the vacuum deposition process is expensive and low throughput. Second, in most of applications, 150 nm or thicker of ITO is needed to ensure electrical performance, but at such thicknesses, ITO films become brittle making them not feasible for applications requiring large areas or flexible substrates. Third, to achieve good conductivity and clarity, ITO films ...
Claims
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Patent Timeline
Login to View More IPC IPC(8): H05K1/02H05K1/03H05K1/09
CPCH05K1/0296H05K1/0274H05K1/0393H05K1/0306H05K1/09H05K1/092B05D1/12B05D3/0254B05D5/12G02F2201/12G02F2202/36G02F2203/01H01L31/022466H01L31/1884H05K2201/0108H05K2201/026
Inventor POON, HAKFEI
Owner NUOVO FILM SUZHOU CHINA INC
