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Plating solution and method for producing plated product

Inactive Publication Date: 2020-02-06
TECHNO ROLL +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

This patent text describes a new plating solution for trivalent chromium plating that can produce plated products with the same quality as those produced by hexavalent chromium plating. The solution contains chromium sulfate and formic acid in a specific range of concentrations. The method for plating using this solution is also provided, including specific temperature and current density ranges. The technical effect of this invention is to expand the application range of environmentally friendly plated products.

Problems solved by technology

Further, it is understood from this graph that it is difficult to perform plating at a current density of 5 A / dm2 or less and to perform plating with excellent covering power in conventional trivalent chromium plating.

Method used

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  • Plating solution and method for producing plated product
  • Plating solution and method for producing plated product
  • Plating solution and method for producing plated product

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examples

[0038]Next, the present invention will be described further in detail by way of examples. However, the present invention is not limited to these examples.

(Summary of the Present Invention: Difference from Conventional Trivalent Chromium Plating)

[0039]FIG. 1 shows the relationship between current density and plating thickness in hexavalent chromium plating and trivalent chromium plating disclosed in general literatures or the like. It is understood from this graph that it is difficult to exert throwing power in conventional trivalent chromium plating since the slope of the straight line that shows the relationship between current density and plating thickness rapidly increases at a current density of about 5 A / dm2. Further, it is understood from this graph that it is difficult to perform plating at a current density of 5 A / dm2 or less and to perform plating with excellent covering power in conventional trivalent chromium plating.

[0040]In contrast, in the case of using the plating sol...

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Abstract

The present invention provides a plating solution containing chromium sulfate and formic acid at a concentration of Cr3+ ions of 0.1 mol / L or more and 1 mol / L or less and a concentration of formic acid of 0.05 mol / L or more and 0.2 mol / L or less.

Description

CROSS-REFERENCE TO RELATED APPLICATION[0001]This application claims priority to Japanese Patent Application No. 2017-21006, the disclosure of which is incorporated herein by reference in its entirety.FIELD[0002]The present invention relates to a plating solution and a method for producing a plated product, more specifically, to a plating solution used for trivalent chromium plating and a method for producing a plated product by applying trivalent chromium plating.BACKGROUND[0003]Conventionally, plated products obtained by applying chromium plating to metal products or plastic products are widely used. In producing the plated products of this type, the cases of using plating solutions containing trivalent chromium, which is environmentally friendly, instead of plating solutions containing hexavalent chromium are increasing (see Patent Literature 1 below).CITATION LISTPatent Literature[0004]Patent Literature 1: JP 2000-249340 ASUMMARYTechnical Problem[0005]There has been a strong dema...

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Application Information

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IPC IPC(8): C25D3/06C25D3/10
CPCC25D3/10C25D3/06
Inventor NAWAFUNE, HIDEMINISHIWAKI, HIROSHIMURATA, TOSHIKAZUYOSHIOKA, HIDEHIROKAMEGAWA, YOSHIYUKI
Owner TECHNO ROLL