Method and apparatus for digital image exposure on photo sensitive material
Patent Information
- Authority / Receiving Office
- CN ยท China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- GUANGDONG IMETTO DIGITAL IMAGING TECH
- Publication Date
- 2008-09-10
- Estimated Expiration
- Not applicable ยท inactive patent
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Abstract
Description
technical field
[0001] The invention relates to an exposure method and device for a photosensitive material, in particular to a method and a device for exposing a digital image on a photosensitive material. Background technique
[0002] Images captured by digital cameras or other digital images sometimes need to be output on photosensitive materials to obtain photos or films. At present, there is a method of exposing digital images on photosensitive materials. The method is to modulate the light intensity of the red, green and blue lasers respectively, and then combine the modulated three laser beams into one beam by various methods. Then it is exposed on the photosensitive material by apochromatic F(ฮธ) scanning to form a latent image, and the photosensitive material is chemically washed to form a color image. The characteristic of this method is that the three-color lasers must be modulated synchronously, and the requirements for light combination are very high, and the th...