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Method of using a manhattan layout to realize non-manhatton shaped optical structures

A non-Manhattan, curvilinear shape technique used in design tools to achieve well-matched, high-resolution results

Inactive Publication Date: 2008-12-31
CISCO TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Generating curves from a series of inputs from mathematical equations provides a problem with high-resolution conversion of discrete polygonal representations

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  • Method of using a manhattan layout to realize non-manhatton shaped optical structures
  • Method of using a manhattan layout to realize non-manhatton shaped optical structures
  • Method of using a manhattan layout to realize non-manhatton shaped optical structures

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Embodiment Construction

[0036] As described above, the present invention relates to a method of fitting polygonal vertices to generate optical devices in such a way that the dimensions of the generated devices and their relative The placement (particularly important when it is required to place the waveguide at the focal point of the lens) preserves sufficient resolution. The method of the present invention involves using the individual vertex(s) of a set of polygons that have been fitted to the curved profile of the optic. The optics can then be generated using equations of the geometry or images drawn by CAD software. The fitted vertices of the polygon are selected to match the grid used in the IC design software. Matching grids ensure efficient input and output of the optics without any change in their physical dimensions. The format of the generated files can be set to suit standard file formats used in the IC industry. Indeed, the method of the present invention is considered suitable for adv...

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Abstract

A system and method employing a Manhattan design system to provide non-Manhattan shaped integrated circuit component designs utilizing a plurality of minimum sized polygons (eg, rectangles) to fit within non-Manhattan component boundaries. Rectangles are suitable such that at least one vertex of each rectangle corresponds to a grid point of the Manhattan design system. The rectangles are preferably formed by taking the pitch of adjacent grid points as the height of each rectangle. As the distance between adjacent grid points decreases, the design better matches the actual shape of the non-Manhattan elements. The systems and methods thus allow the simultaneous placement of electrical and optical circuit components using the same design software and equipment.

Description

[0001] Cross-references to related applications [0002] This application claims priority from Provisional Application No. 60 / 461696, filed April 10,2003. technical field [0003] The present invention relates to a design tool suitable for software package of mask processing technology in IC industry, especially relates to the technology of realizing non-Manhattan geometric shape by using Manhattan definition, allowing electronic and optical devices to be combined into the same mask device. Background technique [0004] Since the current integrated circuit industry is largely based on the use of devices with Manhattan geometries (ie, 45° and 90° bends), it is challenging to incorporate non-Manhattan planar optics with conventional electronics. In particular, typical optical devices include components such as splitters / combiners, waveguides, arrayed waveguide structures, semiconductor optical amplifiers, Mach-Zehnder interferometers, modulators, etc., which require the use of...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/50G06F9/45G06F9/455
Inventor 普拉卡什·约托斯卡马格利特·吉龙威普库马·帕特尔罗伯特·凯斯·蒙特哥莫里卡尔潘都·夏斯特里索哈姆·帕塔克凯瑟琳·A.·亚努舍弗斯奇
Owner CISCO TECH INC