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Method for converting standard process layout to system-level mode in micro-electromechanical system

A technology of micro-electromechanical system and conversion method, which is applied in the fields of electrical digital data processing, special data processing applications, instruments, etc., can solve the problem that the overlapping parts of each component of the process layout cannot be solved automatically.

Inactive Publication Date: 2009-04-01
NORTHWESTERN POLYTECHNICAL UNIV
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  • Abstract
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Problems solved by technology

[0004] In order to overcome the deficiency that the existing technology cannot automatically solve the problem of overlapping parts between the components of the process layout, the present invention proposes a conversion method from the standard process layout to the system-level model, which identifies the components by analyzing the components in the standard process layout, and judges Component type, identify and process overlapping parts of components, convert process-level layout files into system-level model files, so as to realize rapid and automatic data transfer from process level to system level

Method used

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  • Method for converting standard process layout to system-level mode in micro-electromechanical system
  • Method for converting standard process layout to system-level mode in micro-electromechanical system
  • Method for converting standard process layout to system-level mode in micro-electromechanical system

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Embodiment Construction

[0020] see figure 2 , the present invention takes a single-mass flat-plate Z-axis micro-accelerometer as an example to illustrate the conversion method from a standard process layout to a system-level model.

[0021] image 3 Middle 10 is the technological layout of a single-mass flat plate Z-axis micro-accelerometer. The structure includes eight beam components 11, four anchor point components 12, and a quality flat plate component 13; first, extract the geometric information of the structure from the standard layout file and Topological information, after judging, classifying and calculating the extracted information, the layout components are classified into units in the component library, including beam components 11, anchor point components 12, mass plate capacitor components 13, plate capacitor components 15, etc., and then the layout Component library 18 conversion corresponds to the MEMS component library 24 in the system level, including beam components 25, anchor p...

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Abstract

The invention discloses a method for converting standard technical drawing into system modules in microcomputer systems. The invention first reads standard drawing documents from the standard technical drawing document, and then judges and reconstructs the structural information in the read component record information to identify various components, reads their connection relationship, calculates the screen coordinate of system components, and eventually generates the system document. In the process of judging and reconstructing structural information from the read component record information, the invention differentiates and handles the overlapping part of components, so as to convert actual rather than ideal technical drawing documents into system module documents, thus realizing the automatic transmission of data from technique to system.

Description

technical field [0001] The invention relates to a conversion method from a standard process layout in a micro-electro-mechanical system to a system-level model, and belongs to the field of micro-electro-mechanical system design. Background technique [0002] At present, the method from process-level layout to system-level simulation in MEMS is to first draw the device layout, check the corresponding design rules, and manually build the corresponding model at the system level according to the designed layout for performance simulation. An ideal design method is to directly and automatically generate a system-level model based on a standard layout file, which can automatically convert from a standard process layout to a system-level model. [0003] In the literature An Extraction-Based Verification Methodology for MEMS (JOURNAL OFMICROELECTROMECHANICAL SYSTEMS, VOL.11, NO.1, FEBRUARY 2002), Bikram Baidya et al. of CarnegieMellon University proposed a direct layout extraction m...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/50
Inventor 常洪龙谢志雄徐景辉谢建兵苑伟政
Owner NORTHWESTERN POLYTECHNICAL UNIV
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