Method for converting standard process layout to system-level mode in micro-electromechanical system

A technology of micro-electromechanical system and conversion method, which is applied in the fields of electrical digital data processing, special data processing applications, instruments, etc., can solve the problem that the overlapping parts of each component of the process layout cannot be solved automatically.
CN100474319CInactive Publication Date: 2009-04-01NORTHWESTERN POLYTECHNICAL UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
NORTHWESTERN POLYTECHNICAL UNIV
Publication Date
2009-04-01
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a method for converting standard technical drawing into system modules in microcomputer systems. The invention first reads standard drawing documents from the standard technical drawing document, and then judges and reconstructs the structural information in the read component record information to identify various components, reads their connection relationship, calculates the screen coordinate of system components, and eventually generates the system document. In the process of judging and reconstructing structural information from the read component record information, the invention differentiates and handles the overlapping part of components, so as to convert actual rather than ideal technical drawing documents into system module documents, thus realizing the automatic transmission of data from technique to system.
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Description

technical field

[0001] The invention relates to a conversion method from a standard process layout in a micro-electro-mechanical system to a system-level model, and belongs to the field of micro-electro-mechanical system design. Background technique

[0002] At present, the method from process-level layout to system-level simulation in MEMS is to first draw the device layout, check the corresponding design rules, and manually build the corresponding model at the system level according to the designed layout for performance simulation. An ideal design method is to directly and automatically generate a system-level model based on a standard layout file, which can automatically convert from a standard process layout to a system-level model.

[0003] In the literature An Extraction-Based Verification Methodology for MEMS (JOURNAL OFMICROELECTROMECHANICAL SYSTEMS, VOL.11, NO.1, FEBRUARY 2002), Bikram Baidya et al. of CarnegieMellon University proposed a direct layout extraction m...

Claims

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