Unlock instant, AI-driven research and patent intelligence for your innovation.

Wave front aberration measuring device

A technology for measuring device and wave aberration, which can be used in measurement devices, optical devices, optical instrument testing, etc., and can solve the problems of high cost and high cost

Inactive Publication Date: 2009-08-12
OLYMPUS CORP
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, even if the cost of one interferometer is quite high, if more than one is to be prepared, it will cost a lot

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wave front aberration measuring device
  • Wave front aberration measuring device
  • Wave front aberration measuring device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

[0018] figure 1 It is a configuration diagram of a wave aberration measuring device. The illumination system 1 can choose to output laser beams of different arbitrary wavelengths respectively. The wavelength of the laser beam is, for example, a wavelength of 0.633 μm or an arbitrary wavelength in the wavelength range from UV to NIR. The selection of the wavelength of the laser beam output from the illumination system 1 is performed manually or automatically by switching control of the wave aberration analyzer 2 described later. The laser beam 3 output from the illumination system 1 is guided to a Tyman-Green interferometer (hereinafter referred to as an interferometer) 4.

[0019] figure 2 It is a configuration diagram of an example of the lighting system 1. in figure 2 Among the two or more (for example, n types) of wavelengths, one wavelength is set to λ1 and the o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A wave aberration measuring device for measuring wave aberration of an optical system to be tested. The illumination system (1) has laser light sources (1-1, 1-2) that output laser beams of respective wavelengths (λ1, λi), corresponding to the wavelengths of the optical system (8) to be inspected for wave aberration analysis. (λ1, λi) select any laser light source (1-1, 1-2), the wave aberration analysis device (2) according to the wavelength (λ1, λi) and the interference fringe of the laser beam selected in the illumination system (1) The image data is used to analyze the wave aberration of the tested optical system (8).

Description

Technical field [0001] The present invention relates to a wave aberration measuring device for measuring the wave aberration of a subject optical system such as a lens. Background technique [0002] For example, there is a method of evaluating the optical performance, such as transmission performance, of the optical system to be inspected, such as the objective lens of a microscope. In this method, for example, coherent light such as a laser beam is transmitted through the optical system to be inspected, and an interferometer is used to cause the object light and reference light transmitted through the optical system to be inspected to interfere to generate a plurality of interference fringes with different phases. According to the interference fringe analysis The wave aberration of the optical system to be inspected. Such a method of measuring wave aberration is disclosed in, for example, Japanese Patent Application Laid-Open No. 10-96679. [0003] The phase difference of the pl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02G01B9/02G01B11/24
CPCG01B11/2441G01M11/0271
Inventor 江田幸夫
Owner OLYMPUS CORP