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Focus-detector arrangement with X-ray optical grating for phase contrast measurement

A phase contrast and detector technology, which is applied in the direction of measuring devices, radiological diagnostic instruments, X-ray equipment, etc., can solve the problems of length and size parameter limitations, artifacts, and insufficient structural accuracy.

Inactive Publication Date: 2007-08-08
SIEMENS AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Such rigid gratings made of silicon wafers, such as phase gratings as ray distribution gratings, amplitude / absorption gratings as analysis gratings or source gratings, for example, have the problem that, on the one hand, the structure cannot be produced with sufficient precision at reasonable cost
In addition, the length dimensions of such silicon wafers are limited by the parameters of the base material
The combination of several subcomponents can cause artifacts in the measurement
In addition, there is a problem that in fact, only by replacing the corresponding grating can the Talbot distance (Talbotabstand) to adapt to different radiation energies and adjust the period and interference pattern be achieved.

Method used

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  • Focus-detector arrangement with X-ray optical grating for phase contrast measurement
  • Focus-detector arrangement with X-ray optical grating for phase contrast measurement
  • Focus-detector arrangement with X-ray optical grating for phase contrast measurement

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Embodiment Construction

[0067] In order to better understand the invention, the basic principle of the phase contrast measurement is first described using FIGS. 1 to 3 .

[0068] FIG. 1 shows the approximately coherent radiation from the focal point or individually coherent radiation from the source grating passing through a sample P, wherein a phase shift phenomenon occurs after passing through the sample P. FIG. Thus, passing through the grating G 1 form an interference pattern shaded in grey, which is aided by the grating G 2 In the subsequent detector D 1 As well as at the detector elements thereof different radiation intensities result for the individual detector elements, wherein an interference pattern or x-ray standing wave field is formed there. For example it can be observed that the detector element E i with analysis grating G 2 the mobile x G relationship and I(E i (x G )) Intensity (I(E i (x G )) as about the intensity I ph lateral displacement x G function), thus obtaining a ...

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PUM

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Abstract

A focus-detector arrangement of an X-ray apparatus is disclosed, for generating projective or tomographic phase contrast recordings of a subject. In at least one embodiment, least one grating of a focus-detector arrangement includes, at least partially, a macroscopically homogeneous medium which, when excited by an energy source, assumes a periodic structure / standing wave field that leads to beam splitting and the formation of an interference pattern when the X-ray beam passes through.

Description

technical field [0001] The invention relates to a focus-detector arrangement of an X-ray system for producing projection or tomographic phase-contrast photographs of an object under examination, which consists at least of the following: [0002] - a radiation source arranged on the first side of the examination object with a focal point for generating a preferably fan-shaped or cone-shaped beam, [0003] - a phase grating arranged in the ray path on the opposite second side of the object under examination, which produces an interference pattern of the X-ray radiation in a predetermined energy region of the X-ray radiation, and [0004] - An evaluation detection system which detects at least the interference pattern generated by the phase grating with respect to its intensity distribution in a position-resolved manner in order to determine the phase shift therefrom in a position-resolved manner. Background technique [0005] Such focus detector arrangements are known for pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61B6/00G01N23/04G01N23/20G01N23/06H05G1/02H05G1/62G01T1/28G01T7/00G21K1/06G21K1/02
CPCA61B6/4291A61B6/484G01N2223/419G01N2223/612
Inventor 乔基姆·鲍曼马丁·恩格尔哈特乔尔格·弗罗伊登伯格埃克哈德·亨普尔马丁·霍海塞尔托马斯·默特尔迈耶斯蒂芬·波普斯库曼弗雷德·舒斯特
Owner SIEMENS AG