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Fluid supply system used in device for manufacturing IC

A fluid supply and fluid technology, applied in the direction of circuit, feeding device, semiconductor/solid-state device manufacturing, etc., can solve the problem that it is not easy to adjust heat

Active Publication Date: 2007-11-28
SEMES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, regulating the heat is not easy

Method used

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  • Fluid supply system used in device for manufacturing IC
  • Fluid supply system used in device for manufacturing IC
  • Fluid supply system used in device for manufacturing IC

Examples

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Embodiment Construction

[0020] The invention will now be described in more detail with reference to the accompanying drawings, in which preferred embodiments of the invention are shown. However, this invention may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the heights of layers and regions are exaggerated for clarity.

[0021] Although a system for supplying chemicals to a wafer etching device will now be described in an exemplary embodiment of the present invention, the present invention can be applied to all fluid supply systems that supply fluid to a plurality of devices. Also, the etchant of the embodiments may be different kinds of fluids.

[0022] In the exemplary embodiment, the nozzles 160 may be installed in respective processing devices, or...

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Abstract

The present invention is directed to a system for supplying chemicals to a plurality of nozzles to fabricate integrated circuits. The system includes a supply line, a return line, and a selecting part for supplying a constant amount of chemicals to the return line or one of nozzles. According to the invention, a constant amount of chemicals are supplied from a chemical storage irrespective of the number of nozzles requiring a supply of chemicals. This enables a pump to avoid overworking and suppress the conventional problem that a determined time is required for enabling chemicals to reach a fixed temperature.

Description

technical field [0001] The present invention relates to an apparatus for manufacturing a semiconductor device, and more particularly, to a fluid supply system for supplying a predetermined fluid to a plurality of apparatuses. Background technique [0002] In general, during the process of manufacturing semiconductor devices, multiple layers, such as polysilicon, oxides, nitrides, and metals, are typically formed on a wafer that is used as a semiconductor substrate. Photoresist material overlies the layer. The pattern formed on the photomask using the exposure process is transcribed onto the photoresist material. In the development process, the photoresist material is selectively removed to form a pattern thereon. While using the photoresist as a mask, an etching process is performed to form the same pattern on the wafer as that formed on the photoresist. The nozzle is installed in an etching device that performs an etching process. Nozzles in a plurality of etching appar...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/306
CPCB01J4/02B01J2219/00164B01J4/002
Inventor 安斗根朴平宰
Owner SEMES CO LTD
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