Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Protection film components containing vessel and manufacturing method thereof

A technology of protective film and storage container, which can be used in semiconductor/solid-state device manufacturing, instruments, electrical components, etc., and can solve problems such as difficulty in cleaning photomasks

Inactive Publication Date: 2007-12-12
SHIN ETSU CHEM IND CO LTD
View PDF1 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Therefore, such operations are usually performed in a clean room, and even then it is quite difficult to keep the photomask clean frequently

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Protection film components containing vessel and manufacturing method thereof
  • Protection film components containing vessel and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0066] Hereinafter, examples of the present invention will be described, but the present invention is not limited thereto.

[0067] The pellicle storage container 10 shown in FIGS. 1 and 2 was produced. The structure of the pellicle assembly storage container 10 is mainly composed of a container body 1 and a container cover 2, both of which are antistatic ABS resin (surface resistance value 5×10 11 Ω / □) formed by molding.

[0068] In the pellicle assembly storage container 10 of FIG. 1 , the top surface of the cover body 2 is designed to form a convex shape even if bent due to its own weight, so that the top surface will not adhere to the pellicle 3 .

[0069] In the pellicle assembly storage container 10 of FIG. 2 , the top surface of the cover body 2 is designed to be in a gentle convex shape, so as to counteract the bending amount caused by the weight of the top surface itself and make it horizontal.

[0070] Fig. 3 is a diagram showing a vacuum forming mold used to manuf...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a photoetching protection film component container, which avoids defilement of the protection film and keeps quality in storage, transportation, and operation. The protection film component container is composed of container body carrying protection film and cover which covers and protects the protection film and blocks on the edge of the container body. The container characters in that: the container is designed to protuberant shape to avoid bending to the protection film by own weight.

Description

technical field [0001] The present invention relates to a storage container for a photolithographic pellicle assembly used as a dust-proof device when manufacturing articles such as semiconductor devices, printed substrates, and liquid crystal displays, and a method for manufacturing the same. Background technique [0002] In the manufacture of semiconductor devices such as LSI or articles such as liquid crystal displays, semiconductor wafers or glass substrates for liquid crystals are irradiated with light to form patterns. If the photomask or shrink photomask used at this time (hereinafter only If there is dust attached to the photomask), the dust will block the light or refract the light, causing damage to the transferred pattern. [0003] Therefore, such operations are usually performed in a clean room, and even then it is quite difficult to keep the photomask clean. Therefore, a method of attaching a pellicle assembly on the surface of the photomask as a dust preventer...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/14H01L21/027B65D85/30B65D43/06B65D85/86G03F1/40G03F1/64
CPCG03F1/62G03F1/66
Inventor 野崎聪
Owner SHIN ETSU CHEM IND CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com