Device and method for application of an even thin fluid layer to substrates

A thin liquid layer and equipment technology, applied in liquid injection devices, sustainable manufacturing/processing, photovoltaic power generation, etc., can solve condensation dripping, hinder uniform wetting or uniform coating, and cannot ensure uniform distribution of fog, etc. problem, to achieve the effect of improving uniformity, uniformity and effective transportation

Inactive Publication Date: 2008-04-16
SCHMID TECH SYST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A disadvantage of this known device is that it does not guarantee an even distribution of the mist, since even a slight air flow is sufficient to "blow" the mist
Additionally, the configuration of the processing chamber results in damaging condensation dripping onto the silicon cells, which can prevent uniform wetting or even coating results

Method used

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  • Device and method for application of an even thin fluid layer to substrates
  • Device and method for application of an even thin fluid layer to substrates

Examples

Experimental program
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Embodiment Construction

[0029] The function of the device 10 as described in FIG. 1 is to apply a uniform thin phosphoric acid layer to a silicon substrate or cell 12 for photovoltaic applications. In this article, the silicon substrate 12 is passed in and out along the direction of arrow A on the conveying device 13, and during the conveying movement, the silicon substrate 12 is conveyed through the high-frequency ultrasonic device 11 in the processing chamber 14. The phosphoric acid mist 15 makes the phosphoric acid layer of the silicon substrate 12 uniform.

[0030] According to FIG. 1, the tray 16 containing phosphoric acid is arranged on the bottom of the processing chamber 14 extending in a prescribed length perpendicular to the plane of the drawing. The phosphoric acid pan 16 is connected to the phosphoric acid tank 19 through a pipeline 18. Advantageously, the phosphoric acid from the tank 19 in the pan 16 can be adjusted as required. A high-frequency ultrasonic device 11 is attached to the botto...

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Abstract

The coating machine (10) has a transport system (13) consisting of a conveyer belt (29). It carries silicon substrates (12) into a hood (41) in which they are exposed to a mist (15) of phosphoric acid. An ultrasonic generator (11) in the supply hopper (14) has a piezoelectric element and a quartz glass nozzle (68) drawing in liquid and projecting just above the liquid surface (20). The mist goes down a shaft (25) to the hood, and is sucked out of the end of the hood through a woven plastics layer (45) into a suction chamber (43) by a pump (48). An overflow arrangement (52-57) moves overflow liquid to a holding tank (19).

Description

Technical field [0001] The present invention relates to a method according to claim 1 and the preamble of claim 14 for applying a uniform thin liquid layer, especially a phosphoric acid layer, to a substrate, especially a silicon cell for photovoltaic applications The present invention also relates to a device according to the preamble of claim 18 for applying a uniform thin liquid layer, especially a phosphoric acid layer, to a substrate, especially a silicon cell for photovoltaic applications method. Background technique [0002] In order to be able to manufacture photovoltaic cells made of silicon, the unfinished cells must first be doped with phosphorus. In this first step, the battery is wetted with phosphoric acid and the wetted battery is placed in a high temperature furnace at approximately 800°C to 900°C, where phosphorus diffuses from the dried acid into the silicon substrate. The coating is designed to be very uniform to achieve a balanced distribution during the diffu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00
CPCH01L21/67748H01L21/6715H01L31/1804B05B7/0012B05B17/0615Y02E10/50B05B15/0406Y02E10/547B05B14/00Y02P70/10Y02P70/50H01L31/18H01L31/04H01L21/02H01L21/00
Inventor 克里斯蒂安·布赫纳约翰·布鲁纳赫尔穆特·卡尔姆巴赫约瑟夫·真蒂舍尔
Owner SCHMID TECH SYST
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