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Active reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool

A technology of lithography equipment and mask, applied in the field of lithography equipment

Inactive Publication Date: 2008-08-27
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0015] Therefore, there is no room in such lithographic apparatus for inserting an analyzer to provide field-resolved measurements of the projected radiation beam

Method used

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  • Active reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool
  • Active reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool
  • Active reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool

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Embodiment Construction

[0067] In one embodiment, the polarization state can be well defined and known during the wafer exposure process, so that the image quality on the wafer level can be improved, resulting in a small line width, especially in the projection lens with a high NA value. Case. In order to measure and monitor the exact polarization state of the light used for wafer exposure, the polarization measurement has to be performed in the wafer scanner. In order to quantify and monitor the illuminator from the perspective of polarization, the sensor can be positioned on the horizontal plane of the reticle. In addition, if the polarization behavior of the projection lens needs to be monitored or quantified, additional optical elements can be implemented on the wafer level.

[0068] In some configurations of the invention, the polarization sensor can be viewed as having two parts. The first part includes an optical element that processes the polarization of the illuminator light (for example a retar...

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Abstract

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retaxder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

Description

[0001] Related references [0002] This application claims priority to the U.S. Patent Application No. 11 / 361,049 filed on February 24, 2006. US 11 / 361,049 is a partial continuation application of the US Patent Application No. 11 / 065,349 filed on February 25, 2005, entitled "Lithographic Equipment". The contents of these two applications are incorporated herein by reference in their entirety. The application also claims the priority of the US Patent Application No. 60 / 689,800 filed on June 13, 2005, and the content of the application is also incorporated herein by reference in its entirety. Technical field [0003] The invention relates to a lithography equipment, a method for determining polarization properties, a projection lens polarization sensor, a lithography projection system, a method for determining the polarization state, and an active reticle tool , A method of patterning the device, a passive reticle tool, an analyzer and a polarization sensor. Background technique [...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG01M11/0264G03F7/70566G03F7/706G03F7/7085
Inventor 马库斯·艾德里纳斯·范德柯克霍夫威廉姆斯·皮卓斯·德波艾亨瑞克斯·罗伯特斯·玛丽·范格瑞文波奥克迈克·弗兰索斯·休伯特·克拉森海考·维克特·考克马提基恩·杰勒德·多米尼克·维瑞恩斯坦摩·尤特迪基克威廉姆斯·贾克布斯·玛丽安·罗奥杰卡斯约翰内斯·玛丽安·库普利昂·范道仁雅各布·桑尼威尔德欧文·约翰内斯·马丁内斯·吉林
Owner ASML NETHERLANDS BV