Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photoconductive device

An electrode, semiconductor technology, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve problems such as configuration limitations

Inactive Publication Date: 2011-04-13
PICOMETRIX
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problem, however, is that such semiconductors, like all narrowing bandgap semiconductors, are severely limited in their configuration as photoconductive switches.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photoconductive device
  • Photoconductive device
  • Photoconductive device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] Although it looks similar in function to a photodiode, the photoconductive switch is different in the following main aspects:

[0020] 1. The response time of the photoconductive switch can be mainly determined by the carrier lifetime of the semiconductor rather than by the applied electric field that depends on the geometry as in the photodiode. This means that a photoconductive switch with a gap of 1 μm can have a sub-picosecond lifetime, while the response time of a photodiode with a similar structure is several picoseconds. This also means that its response time does not depend on the applied electric field. The response time of a photoconductor with a fast carrier lifetime and a 1mV bias applied to the gap is the same as that of a photoconductor with a 1V bias.

[0021] 2. The applied electric field across the photoconductive switch affects the generated photoelectric flux. In contrast, the voltage across the photodiode has almost no effect on the photoelectric flux. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A semiconductor structure includes a GaAs or InP substrate, an InxGa1-xAs epitaxial layer grown on the substrate, where x is greater than about 0.01 and less than about 0.53, and a wider bandgap epitaxial layer grown as a cap layer on top of the InxGa1-xAs epitaxial layer.

Description

[0001] Related application [0002] This application claims the priority of U.S. Provisional Patent Application No. 60 / 633,862, the filing date of which is December 7, 2004, and the entire contents of which are incorporated herein by reference. Technical field [0003] The present invention relates to epitaxial growth type semiconductors. Background technique [0004] In order to generate picosecond or subpicosecond electrical transients by laser pulses, special processed semiconductors need to be used, and the most suitable is low temperature growth GaAs (LT-GaAs). A photoconductive switch based on this material can respond quickly to short laser pulses and can generate fast electrical transients when configured as a pulse generator. It can also be configured as a sampling gate to sample and measure short (picosecond) segments of unknown radio waves. It is the essence of sampling oscilloscopes to reconstruct and display the shape of the electric wave by sequentially sampling all ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/09
CPCH01L31/09H01L31/03046H01L29/7371
Inventor 罗伯特·N·萨克斯马修·M·加兹维耶基斯蒂文·L·威廉姆森
Owner PICOMETRIX
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products