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Four-range multiplication system far-field monitoring device and collimating method thereof

A technology of amplifying system and monitoring device, applied in the directions of instruments, optics, optical components, etc., can solve the problems of difficult four-pass magnification system application, high cost, limited accuracy, etc.

Inactive Publication Date: 2009-04-15
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

This method is not only costly but also has limited accuracy, and it is difficult to apply in a four-pass amplification system with a relatively complex structure.

Method used

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  • Four-range multiplication system far-field monitoring device and collimating method thereof
  • Four-range multiplication system far-field monitoring device and collimating method thereof
  • Four-range multiplication system far-field monitoring device and collimating method thereof

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Embodiment Construction

[0026] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0027] see first figure 1 , figure 1 It is a schematic diagram of the optical path of the far-field monitoring device of the four-pass amplification system of the present invention. As can be seen from the figure, the composition of the far-field monitoring device of the four-pass amplification system of the present invention includes:

[0028] A four-pass amplification system consisting of the first reflector 101, polarizing reflector 111, first lens 105, half-wave plate 112, filter aperture plate 106, second lens 109 and second reflector 110 in sequence, the described The first filter hole 301, the second filter hole 302, the third filter hole 303 and the fourth filter hole 304 are distributed symmetrically in the center of the filter hole plate 106, which are closely ...

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Abstract

The invention relates to a distant field monitoring device for a quadruple pass amplifying system of a high power laser aid and a collimating method thereof. The structure of the device comprises: a sampling raster is inserted cling to the filtering aperture plate behind the filtering aperture plate; the illuminating bundle formed by a lighting diode and a collimating lens which are arranged outside the main laser beam of the quadruple pass amplifying system lights the sampling raster in certain angle; an imaging lens and a CCD probing device are arranged along the first stage diffraction light direction, the probing surface of the CCD probing device is arranged on the image plane of the imaging lens and the output terminal of the CCD probing device is connected with a computer. The device solves the difficult problems of the distant field sampling and collimating adjustment of the quadruple pass amplifying system, and has the advantages of simple device and high precision.

Description

technical field [0001] The invention relates to a high-power laser device, in particular to a four-pass amplification system far-field monitoring device and an alignment method for the high-power laser device. Background technique [0002] The schematic diagram of the optical path of the four-pass amplification system of the high-power laser device is as follows: Figure 4 As shown, a four-pass amplification system consisting of the first mirror 101, polarizing mirror 111, first lens 105, half-wave plate 112, filter aperture plate 106, second lens 109 and second mirror 110 in sequence, A resonant cavity made of the first reflecting mirror 101 and the second reflecting mirror 110, in which there is a spatial filter composed of the first lens 105, the half-wave plate 112, the filter aperture plate 106 and the second lens 109, Figure 4 A schematic plan view of the filter aperture plate 106 is as Figure 5 shown. The center of the filter aperture plate 106 is located on the op...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/46G02B27/30G02F1/35
Inventor 高妍琦刘代中朱宝强林尊琪刘晓凤
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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