Substrate temperature adjusting-fixing devices
A technology for fixing substrates and substrates, which is applied in the fields of electric solid-state devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc., and can solve the problem that the substrate 303 cannot be heated to a predetermined temperature, it takes a lot of time, and the resistance heater 307 is damaged, etc. question
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
no. 1 example
[0042] figure 2 is a cross-sectional view showing an apparatus for adjusting and fixing the temperature of a substrate according to a first embodiment of the present invention.
[0043] Such as figure 2 As shown, the device 10 for adjusting and fixing the substrate temperature includes: an electrostatic chuck 11 , a bottom plate 12 and power supplies 14 to 17 .
[0044] The electrostatic chuck 11 includes: a substrate 21 , an electrostatic electrode 22 , a resistance heater 23 , and electrodes 31 to 38 . The base body 21 is adhered to the base plate 12 . The base body 21 includes a substrate placement surface 21A for placing the substrate 20 thereon. For example, ceramics can be used as material for the base body 21 . In the case of using ceramics as the material of the base body 21 , the base body 21 is formed, for example, by firing a plurality of laminated green sheets (not shown). In addition, for example, a glass substrate or a semiconductor substrate (for example,...
no. 2 example
[0078] Figure 6 is a cross-sectional view showing an apparatus for adjusting and fixing the temperature of a substrate according to a second embodiment of the present invention.
[0079] Such as Figure 6 As shown, except that the bottom plate 12 provided in the apparatus 10 for adjusting and fixing the substrate temperature according to the first embodiment is replaced with the bottom plate 81 and an inert gas supply line 82 and an inert gas supply device 83 are additionally provided, according to the second embodiment The apparatus 80 for adjusting and fixing the temperature of the substrate of the example has the same configuration as the apparatus 10 for adjusting and fixing the temperature of the substrate.
[0080] In addition to the construction of the base plate 12 (see figure 2 ), the bottom plate 81 has the same structure as the bottom plate 12 except that an inert gas supply line 85 is further provided.
[0081] An inert gas supply line 85 is embedded in the sole...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 