Method for evaluating repetitive frequency laser damage resistance of optical thin film

A technology of repetition rate and laser damage, which is applied in the direction of scattering characteristic measurement, optical test defect/defect, scientific instruments, etc., can solve the problems of higher precision requirements of online detection equipment, cumbersome data processing methods, increased time cost, etc., to achieve test The effect of simple method

Active Publication Date: 2009-09-09
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] 1. It is necessary to use special online detection equipment to record the pulse sequence when the damage occurs, which increases the material cost, especially in the case of high repetition frequency (KHz), the ac

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  • Method for evaluating repetitive frequency laser damage resistance of optical thin film
  • Method for evaluating repetitive frequency laser damage resistance of optical thin film
  • Method for evaluating repetitive frequency laser damage resistance of optical thin film

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Embodiment Construction

[0024] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0025] see first figure 1 , figure 1 It is the schematic diagram of the testing device of optical thin film anti-repetition frequency laser damage characteristic of the present invention, among the figure: 1 is He-Ne laser device, 2 is 1064nm repetition frequency solid pulse laser (repetition frequency is 5Hz), 3 is laser power meter, 4 is Microscopic detector, 5 is a two-dimensional moving sample stage, 6 is a focusing lens, 7 is a laser energy regulator, 8 is a control computer, 9 and 10 are 632.8nm mirrors, 11 is high-transparency@632.8nm / high-reflection@ 1064nm lens, 12 is 1064nm reflective mirror, 13 is 1064nm low reflective mirror. according to figure 1 A test device for the anti-repetition frequency laser damage characteristics of the optical thin film of the pres...

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Abstract

The invention provides a method for evaluating repetitive frequency laser damage resistance of an optical thin film. The method comprises the following steps: irradiating different test points of a thin film sample to be tested with a series of sequence laser pulse with a certain energy density, determining and recording a damage state of each test point, and calculating small damage probability at the energy density; repeatedly changing the energy density of the laser to irradiate different test points of the thin film sample to be tested, determining and recording the damage probability of each test point, and respectively calculating the small damage probability at each energy density; respectively taking the energy density and the small damage probability as a horizontal coordinate and a longitudinal coordinate to draw a change curve of the small damage probability with the laser energy density, and evaluating the repetitive frequency laser damage resistance of the optical thin film at the energy density corresponding to a damage probability peak value of the probability curve. The energy density is higher, the repetitive frequency laser damage resistance of the optical thin film is better. The method helps simplify and practice methods for evaluating the repetitive frequency laser damage resistance of optical films.

Description

technical field [0001] The invention relates to the evaluation of optical properties of optical thin films, in particular to an evaluation method of optical thin films against repeated frequency laser damage. Background technique [0002] Repetition frequency lasers are widely used in scientific research and industrial fields, and their laser output energy is also continuously increasing, but the optical components used for repetition frequency lasers, especially the anti-laser damage characteristics of optical thin film components, are the bottleneck for increasing the output energy of repetition frequency lasers factor. For a long time, the repetition rate laser damage threshold has been used to evaluate the anti-repetition frequency laser damage characteristics of optical films. The ISO 11254-2 standard specifies the measurement method of the repetition rate laser damage threshold of optical thin film components. This measurement method needs to firstly calculate the dis...

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Application Information

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IPC IPC(8): G01N17/00G01N21/88G01N21/49
Inventor 张东贺洪波赵元安夏燏
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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