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Trichlorosilane producing apparatus

A technology of trichlorosilane and a manufacturing device, which is applied in the directions of halogenated silanes, silicon compounds, halogenated silicon compounds, etc., can solve problems such as low conversion efficiency, and achieve the effects of improving conversion rate, high-efficiency heating, and high-efficiency conversion reaction.

Active Publication Date: 2012-04-25
高纯度硅股份有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art described above, since the high-temperature region is limited to the region heated by radiant heat from the heating element outside the reaction chamber, there is a problem that the conversion efficiency is extremely low.

Method used

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  • Trichlorosilane producing apparatus
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  • Trichlorosilane producing apparatus

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Embodiment Construction

[0041] Embodiments of the trichlorosilane production apparatus of the present invention will be described below with reference to the drawings. First refer to figure 1 The first embodiment will be described.

[0042] Such as figure 1 As shown, the trichlorosilane production apparatus of the present embodiment includes: a reaction vessel 1 into which a supply gas containing silicon tetrachloride and hydrogen is supplied to generate a reaction product gas containing trichlorosilane and hydrogen chloride; a plurality of pellets 2 of a heating body filled in the reaction vessel 1, heated by radiant heat and heat conduction and having a melting point exceeding at least 1400° C.; and a heating mechanism 3 arranged around the reaction vessel 1 and utilizing radiant heat and heat conduction The heat conduction heats the pellets 2 in the reaction vessel 1 described above.

[0043] The reaction container 1 includes a gas supply port 1 a for introducing a supply gas inside, a gas outl...

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Abstract

A trichlorosilane manufacturing apparatus has a reaction container with which a supply gas containing tetrachlorosilane and hydrogen is supplied to inside, to produce reaction production gas containing trichlorosilane and hydrogen chloride, a heat-transfer component having a cavity is filled in the reaction container and has a gas containing material with melting point of 1400[deg] C, and a heating mechanism to heat the heat-transfer component in the reaction container.

Description

technical field [0001] The invention relates to a trichlorosilane manufacturing device for converting silicon tetrachloride into trichlorosilane. [0002] This application claims priority based on Japanese Patent Application No. 2006-314896 filed in Japan on November 21, 2006 and Japanese Patent Application No. 2007-268617 filed in Japan on October 16, 2007, and the contents thereof are incorporated herein. Background technique [0003] Trichlorosilane (SiHCl) used as a raw material for producing high-purity silicon (Si: silicon) 3 ) can be made by making silicon tetrachloride (SiCl 4 : Silicon tetrachloride) reacts with hydrogen to make conversion. [0004] That is, silicon is produced by the reduction reaction and thermal decomposition reaction of trichlorosilane in the following reaction formulas (1) (2). Trichlorosilane is produced by the conversion reaction of the following reaction formula (3). [0005] SiHCl 3 +H 2 →Si+3HCl...(1) [0006] 4SiHCl 3 →Si+3SiCl 4...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107
CPCB01J2208/00513B01J12/007C01B33/10731B01J8/0285B01J2208/00415B01J8/025C01B33/10736
Inventor 生川满敏清水祐司
Owner 高纯度硅股份有限公司
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