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Apparatus and method for introducing particles using a radio frequency quadrupole linear accelerator for semiconductor materials

A linear accelerator, semiconductor technology, used in semiconductor/solid state device manufacturing, accelerators, electrical components, etc.

Inactive Publication Date: 2009-09-16
SILICON GENERAL CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although conventional techniques for forming thin films of solar cells or other materials can be successful, there are still many limitations

Method used

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  • Apparatus and method for introducing particles using a radio frequency quadrupole linear accelerator for semiconductor materials
  • Apparatus and method for introducing particles using a radio frequency quadrupole linear accelerator for semiconductor materials
  • Apparatus and method for introducing particles using a radio frequency quadrupole linear accelerator for semiconductor materials

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Embodiment Construction

[0028] The present invention relates generally to technologies including apparatus and methods for the introduction of charged particles for processing of semiconductor materials. More specifically, the present apparatus and methods provide a system employing a linear accelerator, such as a radio frequency quadrupole linear accelerator, to obtain a particle beam at the MeV level for producing autonomous supported by one or more separable semiconductor films. It should be realized, however, that the present invention has broader applicability; it can also be applied to other types of applications, such as for three-dimensional packaging of integrated semiconductor devices, photonic or optoelectronic devices, piezoelectric devices, flat panel displays, microelectromechanical systems ("MEMS"), nanotechnology structures, sensors, actuators, integrated circuits, biological and biomedical instruments, etc.

[0029] For the purposes of the following disclosure, a "self-supporting (o...

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Abstract

A system for forming one or more detachable semiconductor films capable of being free-standing. The apparatus includes an ion source to generate a plurality of collimated charged particles at a first energy level. The system includes a linear accelerator having a plurality of modular radio frequency quadrupole (RFQ) elements numbered from 1 through N successively coupled to each other, where N is an integer greater than 1. The linear accelerator controls and accelerates the plurality of collimated charged particles at the first energy level into a beam of charge particles having a second energy level. RFQ element numbered 1 is operably coupled to the ion source. The system includes an exit aperture coupled to RFQ element numbered N of the RFQ linear accelerator. In a specific embodiment, the system includes a beam expander coupled to the exit aperture, the beam expander being configured to process the beam of charged particles at the second energy level into an expanded beam of charged particles. The system includes a process chamber coupled to the beam expander and a workpiece provided within the process chamber to be implanted.

Description

[0001] References to related applications [0002] This non-provisional patent application claims priority to US Provisional Patent Application Serial No. 60 / 864,966, filed November 8, 2006, which is hereby incorporated by reference in its entirety for all purposes. technical field [0003] Embodiments in accordance with the present invention generally relate to techniques including apparatus and methods for introducing charged particles for semiconductor material processing. More specifically, embodiments of the apparatus and method provide a system that employs a linear accelerator (Linac), such as a radio frequency quadrupole linac, to obtain MeV-level particle beams for the production of One or more separable semiconductor films capable of self-supporting (or self-supporting) for device applications of batteries. It should be understood, however, that the present invention has broader applicability; it can also be applied to other types of applications, such as for three-...

Claims

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Application Information

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IPC IPC(8): H05H7/00H01L21/425
Inventor 弗兰乔斯·J·亨利艾伯特·拉姆巴巴克·阿迪比
Owner SILICON GENERAL CORPORATION
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