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Chemical vapor deposition apparatus

A technology of chemical vapor deposition and equipment, which is applied in gaseous chemical plating, electrical components, coatings, etc., and can solve problems such as difficult substrate transportation

Inactive Publication Date: 2011-03-16
SFA ENG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this situation, when the position of the board handling robot 40 is changed from H1 to H2 in the initial assembled state due to the deformation of the bottom 35, it is difficult to transfer the substrate to the loading chamber or the process module chamber. a precise location

Method used

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  • Chemical vapor deposition apparatus
  • Chemical vapor deposition apparatus
  • Chemical vapor deposition apparatus

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Embodiment Construction

[0038] This application has claimed priority in Korean Patent Application No. 10-2008-0050280 filed on May 29, 2008 at the Korean Intellectual Property Office.

[0039]The accompanying drawings are used to illustrate the embodiments of the present invention, and are cited to gain a sufficient understanding of the present invention and its advantages. Hereinafter, embodiments of the present invention are explained and described in detail with reference to the accompanying drawings. And the same reference element number refers to the same element.

[0040] The following description is for reference. A substrate mentioned below may refer to a flat panel display, including a liquid crystal display (LCD) substrate, a plasma display panel (PDP) substrate and an organic light emitting diode (OLED) substrate. For the convenience of explanation, the word "substrate" used in the present embodiment can be any type of substrate mentioned above.

[0041] figure 2 is a structural diagra...

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Abstract

The invention discloses a chemical vapor deposition apparatus, which comprises the following components: a transmission module chamber, which connects with a load chamber and a process module chamber, and is provided with a controlled device setting hole in bottom central area; a support frame, which supports a lower surface of the transmission module chamber; a cardinal plate processing self-controlled apparatus, which is provided with an upper component that set in the transmission module chamber by inserting the cardinal plate processing self-controlled apparatus into the self-controlled apparatus setting hole, and transmit the cardinal plate to the load chamber and the process module chamber; and a transform absorption unit, which links to the bottom and the cardinal plate process self-controlled apparatus, to buffer and absorb bottom transformation, and avoids transferring the bottom transformation to a cardinal plate process self-controlled apparatus.

Description

technical field [0001] The present invention relates to transferring a substrate to a precise position in a load chamber, or to a process chamber, to avoid deformation of the bottom of a transfer module chamber due to internal pressure changes or external forces such as vibrations , resulting in a chemical vapor deposition equipment that changes the position of a substrate processing automatic control device. Background technique [0002] Flat panel displays have been widely used in television products, computer screens, or personal portable terminals. The flat panel display may include a liquid crystal display (liquid crystal display, LCD), a plasma display panel (plasma display panel), and an organic light emitting diode (organic light emitting diode). Among these flat panel displays, liquid crystal displays use an optical switching phenomenon to display numbers or image, and use the voltage difference between the upper and lower glass substrate electrodes to change the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/44
CPCC23C16/54H01L21/67167H01L21/67201H01L21/67742
Inventor 张祥来李相琝
Owner SFA ENG CORP