Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method
A technology of a substrate processing device and a substrate processing method, which is applied to each unit, substrate processing device and substrate processing, substrate holding mechanism and substrate holding, various components or devices, and the field of substrate holding mechanism, which can solve the problem of unstable flow of pure water, etc. problems, to achieve reliable control, improve processing efficiency, and improve responsiveness and latency
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[0121] Hereinafter, embodiments of the substrate processing apparatus of the present invention will be described in detail with reference to the drawings. The same or equivalent structural elements are given the same reference numerals and their repeated description is omitted.
[0122] figure 1 It is a plan view showing the overall structure of a substrate processing apparatus according to an embodiment of the present invention. Such as figure 1 As shown, the substrate processing apparatus has a housing 1 having a substantially rectangular shape, and the interior of the housing 1 is divided into a load / unload part 2, a polishing part 3, and a cleaning part 4 by partition walls 1a and 1b. The loading / unloading section 2, the polishing section 3, and the cleaning section 4 described above are each independently combined and exhausted independently. In addition, the substrate processing apparatus has a control unit 5 that controls substrate processing operations.
[0123] The loadi...
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