Unlock instant, AI-driven research and patent intelligence for your innovation.

Fpd substrate and semiconductor wafer inspection system using duplicate images

An inspection system, repeating image technology, used in semiconductor/solid state device testing/measurement, measurement devices, material analysis by optical means, etc., to reduce costs

Inactive Publication Date: 2011-08-31
WISEPLANET
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In the above cases, only defects or foreign matter observed by one light source can be scanned onto the image, so usually the inspection device can only be used as a dedicated inspection device with high detection capability for specific parts

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fpd substrate and semiconductor wafer inspection system using duplicate images
  • Fpd substrate and semiconductor wafer inspection system using duplicate images
  • Fpd substrate and semiconductor wafer inspection system using duplicate images

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] In order to accomplish the above-mentioned problems, an FPD substrate and semiconductor wafer inspection system using repeated images according to an embodiment of the present invention analyzes the images captured by the camera, and the inspection system includes:

[0045] The camera is installed on the upper side of the flat display panel or the semiconductor wafer, and captures the reflected light generated by the light supplied from the first lighting unit being reflected by the flat panel display panel or the semiconductor wafer, or captures the light supplied from the second lighting unit Photographing the reflected light generated by the reflection of particles existing in the flat panel display panel or semiconductor wafer;

[0046] The first lighting unit, which is arranged in a direction corresponding to the camera above, is used to supply the camera with the amount of light required for shooting:

[0047]The second lighting unit, which is arranged in a direct...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to an FPD substrate and semiconductor wafer inspection system using duplicate images. More particularly, the present invention relates to an FPD substrate and semiconductor wafer inspection system using duplicate images capable of acquiring two or more duplicated images through a single scanning of the particles adhered to a flat panel display, existing on a surface of the flat panel display and projected from the surface of the flat panel display. The present invention has advantages in that most of the defects and foreign substances can be detected by the typesthereof through a single inspection.

Description

technical field [0001] The present invention relates to an FPD substrate and a semiconductor wafer inspection system using repeated images, and more specifically, to an FPD substrate and a semiconductor wafer inspection system using repeated images: For protruding particles, two or more images are repeatedly acquired in one scan, so that most defects and foreign objects can be detected by category with one inspection. Background technique [0002] Conventionally, as one of the methods of inspecting a display panel or a semiconductor wafer, a method of irradiating light from a single light source to a transparent member such as glass or a liquid crystal display panel constituting a display panel, a wafer, etc. Partial reflection occurs, and by detecting the reflected light, it is possible to determine whether the display panel or the semiconductor wafer is defective. [0003] Such as figure 1 As shown, a flat display panel or a semiconductor wafer 10 is placed on an inspect...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/66
CPCG01N21/8851G01N21/9501G01N2021/8822
Inventor 洪起贤罗相澯金兑洪
Owner WISEPLANET