Substrate cleaning chamber and components
A technology for cleaning chambers and substrates, used in electrical components, semiconductor/solid-state device manufacturing, vacuum evaporation plating, etc., to solve problems such as uneven heating, corrosion of stainless steel walls and gaskets, and scratching of substrates.
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[0070] FIG. 1 illustrates an embodiment of a substrate tool 20 including a cleaning chamber 24 adapted to clean a substrate 22 . The cleaning chamber 24 as shown is suitable for cleaning substrates 22, such as semiconductor wafers; however, the cleaning chamber 24 can be adjusted by those skilled in the art to be suitable for cleaning other substrates 22, such as flat panel displays, polymer panels, or other circuit containing structures. Accordingly, the scope of the present invention should not be limited to the exemplary embodiment of the clean chamber shown herein. Generally, the cleaning chamber 24 includes one or more surrounding walls 30 , which may include an upper wall 32 , side walls 34 , and a bottom wall 36 , and which enclose a processing area 38 . The gas inlet 40 of the cleaning chamber 24 is supplied with energized cleaning gas from a remote chamber 42 . The cleaning gas reacts with the substrate 22 and other surfaces within the chamber 24 . Exhaust gases an...
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Abstract
Description
Claims
Application Information
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