The present invention discloses a large flow
diaphragm valve for
semiconductor manufacturing, which relates to the technical field of high-purity gas valves for
semiconductor manufacturing, and solves the problem of small flow coefficient of diaphragm valves. The
diaphragm valve includes a valve body, a diaphragm, a
valve seat assembly, a
valve stem, a valve sleeve and a
handle. The valve body has an
inlet flow channel and an outlet flow channel. The diaphragm and the valve body surround a receiving cavity. The
valve stem is fixedly connected to the
valve seat assembly. The
valve stem includes a valve stem body and a valve stem convex portion. The valve sleeve is sleeved on the valve stem body and slides relative to the valve stem body. The
handle is sleeved on the outer periphery of the valve sleeve and rotates synchronously with the valve sleeve in the circumferential direction. When the
handle rotates, the valve sleeve rotates around the axis of the valve stem body and approaches or moves away from the
inlet flow channel, driving the valve stem convex portion to approach or move away from the
inlet flow channel, and the valve stem is used to drive the
valve seat assembly to abut or separate from the inner wall of the valve body, and the valve seat assembly is used to close or open the outlet of the inlet flow channel. The
diaphragm valve of the present invention is used to increase the flow coefficient of the diaphragm valve and improve the outlet flow of the diaphragm valve.